Atotech Deutschland Gmbh

Christian Nöthlich

Arnd Kilian

Sebastian Kühne

Donny Lautan

Dieter Metzger

Robert Spreemann

Boris Alexander Janssen Janssen

A method and apparatus for regenerating a plating composition which is suitable for depositing at least one first metal on a substrate where the plating rate in the plating composition is very low, where the concentration of the at least one first metal in the plating composition cannot be easily set at a constant level, and where plating-out of the at least one first metal from the plating composition takes place. The method and apparatus for regenerating a plating composition is suitable for depositing at least one first metal on a substrate at a sufficiently high plating rate, while offering the opportunity to easily adjust the concentration of the at least one first metal in the plating composition at a constant level and to provide the plating composition with sufficient stability against decomposition thereof in order to safeguard the regeneration cell from plated-out first metal.

Method and regeneration apparatus for regenerating a plating composition

Method for regenerating a plating composition

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Berlin, Germany

Christian Nöthlich