Wacker Chemie Ag

Christian Kutza

Heinz Kraus

Dominik Rennschmid

Tobias Weiss

Friedrich Popp

Martin Roeckl

Andreas Hegen

The yield and quality of polysilicon rods produced in the Siemens process are increased by preventing pieces of silicon too large to be removed by flushing with gas from entering reaction gas inlets and offgas outlets by means of protective elements installed in the inlets and/or outlets.

Reactor for depositing polycrystalline silicon

Improved sealing of Siemens reactor electrodes which results in improved reactor campaign times, is accomplished by use of an electrically insulating ring in combination with two seals, a first seal located in a groove in the insulating ring or in a groove in the reactor base plate adjacent the insulating ring, and a second seal not contained in a groove.

Device for insulating and sealing electrode holders in CVD reactors

Siemens CVD reactors are sealed in a manner which facilitates long production campaigns without refurbishing the seals, by the use of at least two seals, and an electrically insulating member having a thermal conductivity of from 1 to 200 W/mK, a sustained use temperature of at least 400&#xb0; C., and a resistivity of more than 1&#xb7;10&#x3a9;cm.

A gas distribution system for a polysilicon deposition reactor eliminates or mitigates the problems associated with prior art distribution systems employs at least two segments which are gas-tightly connected to one another by readily detachable fasteners, with at least one gas inlet opening and one gas outlet opening, the gas distributor of the system being mounted by readily detachable fasteners to the polysilicon reactor.

Growing community of inventors

Ampfing, Germany

Christian Kutza