Synopsys, Inc.

Carl Zeiss Sms Ltd.

Christian K Kalus

Wolfgang Harnisch

Axel Zibold

Thomas Schmoeller

Iouri Malov

Klaus Boehm

The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.

Method for mask inspection for mask design and mask production

Process for determination of properties, particularly, the integrity, of an integrated circuit by calculation, wherein a calculation-simulated image of the circuit is compared with a design of the circuit, and deviations between the image and design are detected.

Method and device for determining the properties of an integrated circuit

Growing community of inventors

Müchen, Germany

Christian K Kalus