Asml Netherlands B.v.

Christian Gerardus Norbertus Hendricus Marie Cloin

Nicolaas Ten Kate

Nicolaas Rudolf Kemper

Michel Riepen

Marco Koert Stavenga

Erik Henricus Egidius Catharina Eummelen

Tijmen Wilfred Mathijs Gunther

Olga Vladimirovna Elisseeva

Michaël Christiaan Van Der Wekken

Vadim Yevgenyevich Banine

Marcus Adrianus Van De Kerkhof

Andrey Alexandrovich Nikipelov

Edwin Te Sligte

Ferdinandus Martinus Jozef Henricus Van De Wetering

A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Lithographic apparatus and a method of operating the apparatus

A component for use in a patterning device environment including a patterning device, wherein the component is treated to suppress EUV plasma-induced contaminant release and/or atomic hydrogen or other radicals induced defectivity. A conduit array comprising at least one conduit, wherein the at least one conduit has been treated to promote adhesion of a contaminant to the at least one conduit.

Component for use in a patterning device environment

Growing community of inventors

Gennep, Netherlands

Christian Gerardus Norbertus Hendricus Marie Cloin