Evatec Ag

Tel Solar Ag

Christian Egli

Andreas Meier

Gaston Van Buuren

Philipp Wagner

Daniele Zorzi

A vacuum treatment apparatus for substrate including a vacuum treatment arrangement. An input load-lock arrangement leads towards and into the vacuum treatment arrangement and an output load-lock arrangement leads from the vacuum treatment arrangement. One of the two load-lock arrangements includes at least two load-locks in series respectively pumped by pumps.

Substrate vacuum treatment apparatus and method therefor

A gate valve for a vacuum chamber comprises two carriers () each connected to a frame structure providing an essentially plane front by two parallel links () and to an actuating rod () by parallel levers (). Upward motion of the actuating rods () by a piston () causes, via the levers (), upward motion of the carriers () which is transformed into a circular motion by the links () where the carriers () at the same time approach the front while remaining parallel to it, moving sealing plates () which are fixed to the carriers () to an active position where they press against the front and seal openings () therein. Retraction of the piston () effects an inverse motion, whereby the sealing plates () are completely removed from the openings () and the latter made easily accessible.

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Sevelen, Switzerland

Christian Egli