Evonik Hanse Gmbh

Robert Boschgmbh

Christian Eger

Irene Jennrich

Stephan Sprenger

Thorsten Adebahr

Johannes Adam

Robert Wieczorreck

Christof Roscher

Manfred Pyrlik

The invention relates to a silicon dioxide dispersion that comprises a) an outer flowable phase containing 1) polymerizable monomers, oligomers and/or prepolymers that can be converted to polymers by non-radical reaction; and/or 2) polymers, and b) a disperse phase containing amorphous silicon dioxide. The inventive dispersion is characterized in that the average particle size dof the silicon dioxide as measured by small angle neutron scattering (SANS) is between 3 and 50 nm at a maximum half-width of the distribution curve of 1.5 d. Such a silicon dioxide dispersion can be easily manufactured even at higher concentrations of the disperse phase and can be used to produce polymer materials that have advantageous properties, especially advantageous mechanical properties.

Silicon dioxide dispersion

The invention relates to a polymeric composition containing: a) at least one epoxy resin; b) at least one copolymer with groups, which react with epoxy resins, and with a glass transition temperature Tof &#x2212;20&#xb0; C. or lower, c) nanoparticles having a mean particle size dranging from 5 to 150 nm that is measured by means of a small-angle neutron scattering (SANS). The inventive composition enables the production of adhesives, composite materials, coatings and casting compounds exhibiting improved mechanical properties, particularly improve impact strength.

Polymeric epoxy resin composition

The object of the patent is to provide a modified reaction resin, comprising: a) at least one cyanate tester; b) at least one polyorganosiloxane contained in the reaction resin in finely distributed form. The thus modified reaction resin is stable for storage for long periods in non-cured form and can be cured to form duromers with advantageous mechanical characteristics.

Modified reaction resin

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Bardowick, Germany

Christian Eger