Asml Netherlands B.v.

Christiaan Theodoor De Ruiter

Peter Ten Berge

Alexander Ypma

Boris Menchtchikov

Hakki Ergün Cekli

Michael James Lercel

Chenxi Lin

Simon Hendrik Celine Van Gorp

Cyrus Emil Tabery

Simon Philip Spencer Hastings

Dag Sonntag

Ruben Alvarez Sanchez

Pierre-Yves Jerome Yvan Guittet

Shih-Chin Liu

Wei Duan

A method and associated computer program for predicting an electrical characteristic of a substrate subject to a process. The method includes determining a sensitivity of the electrical characteristic to a process characteristic, based on analysis of electrical metrology data including electrical characteristic measurements from previously processed substrates and of process metrology data including measurements of at least one parameter related to the process characteristic measured from the previously processed substrates; obtaining process metrology data related to the substrate describing the at least one parameter; and predicting the electrical characteristic of the substrate based on the sensitivity and the process metrology data.

Method to predict yield of a device manufacturing process

A method, and associated system, for determining an optimized set of measurement locations for measurement of a parameter related to a structure applied to a substrate by a semiconductor manufacturing process. The method includes determining a first set of parameter values from a first set of measurements of first structures across a first plurality of locations, for example from target measurements and determining a second set of parameter values from a second set of measurements of second structures across a second plurality of locations, for example using an SEM or e-beam tool on product structures. A correlation is determined between the first set of parameter values and the second set of parameter values and used to determine the optimized set of measurement locations.

Method for determining an optimized set of measurement locations for measurement of a parameter of a lithographic process, metrology system and computer program products for implementing such methods

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Eindhoven, Netherlands

Christiaan Theodoor De Ruiter