Sandia Corporation

Christi Gober Willison

Paul Charles Galambos

Randy J Shul

Ronald P Manginell

W Kent Schubert

Mary-Anne Mitchell

New methods for fabrication of silicon microstructures have been developed. In these methods, an etching delay layer is deposited and patterned so as to provide differential control on the depth of features being etched into a substrate material. Compensation for etching-related structural artifacts can be accomplished by proper use of such an etching delay layer.

Method to control artifacts of microstructural fabrication

A new class of semipermeable membranes, and techniques for their fabrication, have been developed. These membranes, formed by appropriate etching of a deposited silicon nitride layer, are robust, easily manufacturable, and compatible with a wide range of silicon micromachining techniques.

Growing community of inventors

Albuquerque, NM, United States of America

Christi Gober Willison