Asml Netherlands B.v.

Mapper Lithography IP B.v.

Mapper Litohgraphy IP B.v.

Chris Franciscus Jessica Lodewijk

Marc Smits

Johan Joost Koning

Hindrik Willem Mook

Ludovic Lattard

A charged particle beam system is disclosed, comprising: Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

Method and system for the removal and/or avoidance of contamination in charged particle beam systems

A charged particle beam system is disclosed, comprising: wherein the charged particle optical element comprises: wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

An arrangement for generating plasma, the arrangement comprising a primary plasma source () comprising a primary source chamber () and a first coil () for generating plasma in the primary source chamber, a secondary plasma source () comprising a secondary source chamber () and a second coil () for enhancing plasma generated by the primary plasma source and/or generating plasma in the secondary source chamber generating plasma in the primary source chamber, a hollow guiding body () arranged for guiding at least a portion of the plasma generated by the primary plasma source to the secondary plasma source, and an outlet () for emitting at least a portion of the plasma generated by the arrangement.

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Delft, Netherlands

Chris Franciscus Jessica Lodewijk