Rohm & Haas Electronic Materials LLC

ChoongBong Lee

James F Cameron

James W Thackeray

Emad Aqad

Xisen Hou

Tomas Marangoni

A photoresist composition, comprising an acid-sensitive polymer comprising a repeating unit having an acid-labile group; an iodonium salt comprising an anion and a cation, the iodonium salt having Formula (1): wherein Zis an organic anion; Aris substituted or unsubstituted Cheteroaryl group comprising a furan heterocycle; and Ris substituted or unsubstituted hydrocarbon group as provided herein, wherein the cation optionally comprises an acid-labile group, wherein Arand Rare optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and wherein the iodonium salt is optionally covalently bonded through Aror substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through Ror substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Zas a pendant group to a polymer; and a solvent.

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Westborough, MA, United States of America

ChoongBong Lee