Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Samsung Mobile Display Co., Ltd.

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Choong-Ho Lee

Jung-Min Lee

Dong-Gun Park

Hee-Soo Kang

Jae-Man Yoon

Chul Ho Lee

Dong-Uk Choi

Tae-Yong Kim

Suk-Kang Sung

Kyu-Charn Park

Yoon-Chan Oh

Eun-Suk Cho

Keun-Nam Kim

Byung-Yong Choi

Hung-Mo Yang

Young-Joon Ahn

Yoon-Dong Park

Hye-Jin Cho

Byung-yong Choi

Hye-jin Cho

Jung-Dal Choi

Kie Hyun Nam

Hee-Seong Jeong

Suk-Pil Kim

Jae-woong Hyun

Seong-goo Kim

Kie-Hyun Nam

Se-Hoon Lee

Doh-Hyoung Lee

Seung-bae Park

Sung-Sik Yun

Tong-Jin Park

Byung-Kyu Cho

Dong-Hoon Jang

Yun-Gi Kim

Won-joo Kim

Jun-Sik Oh

Won-Kyu Choe

Sang-Yeon Han

Shigenobu Maeda

Tae-Wook Kang

Jeong-Dong Choe

Jong-Sun Sel

Seog-Heon Ham

Sung-Jae Byun

Arnold Gillner

Hyun-pil Noh

Seok-Joon Yoon

Yoon-Moon Park

Se-Jun Park

Young-joon Ahn

Jong-Ho Lim

Hee-soo Kang

Hoon Bae Kim

Sang-Soo Kim

Ki-Hyun Kim

Bong-Soo Kim

Yeong-taek Lee

Si-Young Choi

Byung-Hee Kim

Myeong-Cheol Kim

Jong-Wook Lee

Dong-Won Kim

Chang-Woo Oh

Cheol Kyu Kim

Seung-Hwan Song

Min-sang Kim

Jung-Gun You

Suk-Won Jung

Sung-Hoi Hur

June-mo Koo

Tae-hun Kim

Keon-Soo Kim

Song-Yi Han

Kang-yoon Lee

Dong-Ki Lee

Hyeoung-won Seo

Jung-dal Choi

Jongwook Lee

Keun-Ho Lee

Sang-gu Kang

Chan-Kyoung Moon

Seung-Chul Lee

Jai-Hyuk Song

Kuen-Dong Ha

Kyoung-Lae Cho

Ming Li

Jong-Seo Hong

Kyoung-Soo Lee

Seung-Ho Choi

Young-Bae Yoon

Seung Chul Lee

Jong-Chan Shin

Jin-hyun Shin

Changwoo Oh

Sang-Wook Lim

Je-Kil Ryu

Albert Fayrushin

Seon-Hee Kim

Seonah Nam

A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.

Thin film deposition apparatus

A frame and a mask assembly having the same. The frame supports both ends of each unit mask, each unit mask applying a tensile force in a first direction. The frame includes a frame main body part forming an opening exposing the unit mask, and a first through hole formed by passing through the frame main body part.

Frame and mask assembly having the same

A fin field effect transistor (fin FET) is formed using a bulk silicon substrate and sufficiently guarantees a top channel length formed under a gate, by forming a recess having a predetermined depth in a fin active region and then by forming the gate in an upper part of the recess. A device isolation film is formed to define a non-active region and a fin active region in a predetermined region of the substrate. In a portion of the device isolation film a first recess is formed, and in a portion of the fin active region a second recess having a depth shallower than the first recess is formed. A gate insulation layer is formed within the second recess, and a gate is formed in an upper part of the second recess. A source/drain region is formed in the fin active region of both sides of a gate electrode.

Fin FET and method of fabricating same

A metal sheet holding device for manufacturing a pattern mask used in manufacturing processes of a flat panel displays include a first holder and second holder. The first holder includes an adhesive layer contacting edge portions of a metal sheet, and a first frame supporting the metal sheet using the adhesive layer. The second holder includes a second frame below the first frame, a supported plate positioned at the center of the second frame, and an adhered unit positioned between the central portion of a metal sheet and the supported plate. The adhered unit generates an electrostatic force or a magnetic force to hold the central portion of the metal sheet.

Metal sheet holding device for manufacturing pattern mask

A thin film deposition apparatus including a deposition source having a crucible to contain a deposition material and a heater to heat and vaporize the deposition material; a nozzle unit disposed at a side of the deposition source along a first direction and having a plurality of nozzle slits to discharge the deposition material that was vaporized; a plurality of emission coefficient increasing units disposed toward the nozzle unit within the deposition source and increasing a quantity of motion of the deposition material that is discharged toward the nozzle unit; a patterning slit sheet disposed opposite to the nozzle unit and having a plurality of patterning slits arranged along the first direction; and a barrier plate assembly disposed between the nozzle unit and the patterning slit sheet along the first direction, and having a plurality of barrier plates that partition a space between the nozzle unit and the patterning slit sheet into a plurality of sub-deposition spaces.

Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same

A laser processing apparatus includes: a laser generator that generates a laser beam, a diffractive optical element that divides the laser beam generated by the laser generator into a plurality of sub-laser beams, and a beam gap adjustor that adjusts a gap between neighboring ones of the plurality of sub-laser beams. Therefore, by installing a diffractive optical element that divides a laser beam that is generated by the laser generator into the plurality of sub-laser beams and a beam gap adjustor to adjust a gap between a plurality of sub-laser beams, the laser processing apparatus can form a processing pattern of various resolutions in a shadow mask while improving a processing speed of the shadow mask.

Laser processing apparatus

A method of forming a pattern on a mask sheet using a laser beam includes determining a target scan line with respect to the mask sheet, which corresponds to a position of the pattern on a final mask sheet, determining a correction scan line with respect to the mask sheet, along which the laser beam is scanned to form the pattern of the final mask sheet, applying a counter force to the mask sheet, fixing the mask sheet onto a mask frame while the counter force is applied to the mask sheet, scanning the laser beam along the correction scan line, and releasing the counter force which is applied to the mask sheet.

Method for forming a mask pattern using a laser

A laser processing apparatus includes a laser generator for generating laser beams, a diffraction optic element for dividing the laser beam generated by the laser generator into a plurality of sub-laser beams, and a beam number controller for controlling the number of the plurality of sub-laser beams. Accordingly, the diffractive optic element that splits a laser beam generated by the laser beam generator into a plurality of sub-laser beams and the beam number controller that controls the number of sub-laser beams are provided so that the processing speed of a processing target can be improved and, at the same time, the number of laser beams can be promptly controlled, thereby promptly forming various patterns of the processing target.

A thin film deposition apparatus includes a deposition source that is disposed opposite to a substrate and holds a deposition material that is vaporized; a first nozzle unit disposed between the substrate and the deposition source and having first slit units arranged in a first direction of the substrate; a second nozzle unit disposed between the first nozzle unit and the substrate and having second slit units arranged in the first direction of the substrate; and at least one barrier member assembly disposed between the first nozzle unit and the second nozzle unit and partitioning the space between the first nozzle unit and the second nozzle unit. A deposition blade is optionally disposed in any space formed between the first nozzle unit and the second nozzle unit during a stand-by mode to prevent the deposition of the deposition material from being deposited onto undesirable regions of the chamber.

Thin film deposition apparatus including deposition blade

A display device includes a substrate, a display unit formed on the substrate, a sealing substrate bonded to the substrate by a bonding layer surrounding the display unit, the sealing substrate comprising a complex member and an insulating member, wherein the complex member has a resin matrix and a plurality of carbon fibers and the insulator is connected to an edge of the complex member and comprises a penetration hole, a metal layer disposed at one side of the sealing substrate wherein the one side faces the substrate, and a conductive connection unit filling in the penetration hole and contacting the metal layer. The complex member and the insulator may be coupled by tongue and groove coupling along a thickness direction of the sealing substrate where the protrusion-groove coupling structure is top-to-bottom symmetric and the insulator may have a thickness identical to that of the complex member.

Display device and organic light emitting diode display

A semiconductor device and a method of fabricating the same are provided. The semiconductor device includes a substrate including a first region and a second region, a first transistor and a second transistor formed on the first region and the second region, respectively, a first contact formed on the first transistor, and a second contact formed on the second transistor. The first contact includes a first work function control layer having a first thickness and a first conductive layer formed on the first work function control layer, the second contact includes a second work function control layer having a second thickness different from the first thickness and a second conductive layer formed on the second work function control layer, and the first contact and the second contact have different work functions.

Semiconductor device and method for fabricating the same

Growing community of inventors

Gyeonggi-do, South Korea

Choong-Ho Lee