Applied Materials, Inc.

Chiukun Steven Lai

Wei W Wang

James S Papanu

Chien-Teh Kao

Roderick Craig Mosely

Mark Naoshi Kawaguchi

Bingxi Sun Wood

Hua Ai

A substrate cleaning apparatus has a remote source to remotely energize a hydrogen-containing gas to form an energized gas having a first ratio of ionic hydrogen-containing species to radical hydrogen-containing species. The apparatus has a process chamber with a substrate support, an ion filter to filter the remotely energized gas to form a filtered energized gas having a second ratio of ionic hydrogen-containing species to radical hydrogen-containing species, the second ratio being different than the first ratio, and a gas distributor to introduce the filtered energized gas into the chamber.

Cleaning of native oxide with hydrogen-containing radicals

Growing community of inventors

Sunnyvale, CA, United States of America

Chiukun Steven Lai