Taiwan Semiconductor Manufacturing Comp. Ltd.

Ching-Yu Pan

Yuan-Hung Chiu

An Chyi Wei

Hsiu-Hao Tsao

Chung-Shu Wu

Ying-Ya Hsu

A method includes forming a fin on a substrate, forming an insulating material over the fin, recessing the insulating material to form an isolation region surrounding the fin, wherein an upper portion of the fin protrudes above the isolation region, performing a trimming process to reduce a width of the upper portion of the fin, and forming a gate structure extending over the isolation region and the upper portion of the fin.

Growing community of inventors

Kaohsiung, Taiwan

Ching-Yu Pan