International Business Machines Corporation

Ching-Tzu Chen

Anthony J Annunziata

Joel D Chudow

Jin Ping Han

Juntao Li

Shu-Jen Han

Injo Ok

Kevin W Brew

Timothy Mathew Philip

Kangguo Cheng

Carl John Radens

Vijay Narayanan

Takeshi Nogami

Arvind Kumar

Teodor Krassimirov Todorov

Nicholas Anthony Lanzillo

Nathan P Marchack

Robert L Bruce

Philip Joseph Oldiges

Swagath Venkataramani

See-Hun Yang

Utkarsh Bajpai

Peter Kerns

An interconnect structure including conducting layers of topological semi-metals and/or topological insulators. To increase charge carrier density in the conducting layers, a charge carrier doping layer present on at least one surface of the one or more conductive layers of topological semi-metals. The charge carrying doping layers have a charge carrier density greater than the topological semi-metals and/or topological insulators of the one or more conductive layers.

Multi-layer topological interconnect with proximal doping layer

A phase change memory includes a phase change structure. There is a heater coupled to a first surface of the phase change structure. A first electrode is coupled to a second surface of the phase change structure. A second electrode coupled to a second surface of the heater. A third electrode is connected to a first lateral end of the phase change structure and a fourth electrode connected to a second lateral end of the phase change structure.

Multi-level programming of phase change memory device

A computer memory device includes a bottom electrode, a top electrode, and a memory component arranged between the top electrode and the bottom electrode. The memory component is made of a dielectric solid-state material and is in direct contact with the top electrode and the bottom electrode. The computer memory device further includes a proximity heater configured to increase a temperature of a portion of the memory component. The computer memory device further includes a layer of dielectric material in direct contact with the proximity heater. The layer of dielectric material is in direct contact with one of the bottom electrode and the top electrode.

Proximity heater to lower RRAM forming voltage

A first phase change material layer vertically aligned above a bottom electrode, a dielectric layer vertically aligned above the first phase change material layer, a second phase change material layer vertically aligned above the dielectric layer, an inner electrode physically and electrically connected to the first phase change material layer and the second phase change material layer, the inner electrode surrounded by the dielectric layer, a top electrode vertically aligned above the second phase change material layer. A first phase change material layer vertically aligned above a bottom electrode, a filament layer vertically aligned above the first phase change material layer, a second phase change material layer vertically aligned above the filament layer, an inner break in the filament layer connecting the first phase change material layer and the second phase change material layer, a top electrode vertically aligned above the second phase change material layer.

Phase change memory cell with double active volume

A phase change memory (PCM) semiconductor device is provided. The PCM semiconductor device includes: a phase change material stack on a substrate, the phase change material stack including at least two phase change material layers each separated by an insulating layer; a first electrode on a first side of the phase change material stack; and a second electrode on a second side of the phase change material stack, wherein a first one of the phase change material layers has a length that is different from a length of a second one of the phase change material layers.

Phase change memory with multi-level programming

A phase change memory cell for a semiconductor device that includes a heater element on a first conductive layer with a spacer surrounding sides of the heater element. The phase change memory cell includes a first dielectric layer on the conductive layer and on a bottom portion of the spacer surrounding the heater element and a second dielectric layer on the first dielectric layer surrounding a top portion of the heater element. The phase change memory cell includes a phase change material on a top surface of the heater element and on the second dielectric material.

Embedded heater in a phase change memory material

Provided is a method for fabricating an interconnect. The method comprises forming a topological semi-metal layer. The method further comprises patterning the topological semi-metal layer to form one or more interconnects. The method further comprises forming a dielectric layer between the one or more interconnects. The method further comprises forming a hermetic dielectric cap layer on top of the one or more interconnects and the dielectric layer.

Topological semi-metal interconnects

Various embodiments are provided for optimized placement of data structures in a hierarchy of memory in a computing environment. One or more data structures may be placed in a first scratchpad memory, a second scratchpad memory, an external memory, or a combination thereof in the hierarchy of memory according to a total memory capacity and bandwidth, a level of reuse of the one or more data structures, a number of operations that use each of the one or more data structures, a required duration each the one or more data structures are required to be placed a first scratchpad or a second scratchpad, and characteristics of those of the one or more data structures competing for placement in the hierarchy of memory that are able to co-exist at a same time step. The second scratchpad memory is positioned between the external memory and the first scratchpad memory at one or more intermediary layers.

Optimized hierarchical scratchpads for enhanced artificial intelligence accelerator core utilization

A synapse device includes a perpendicularly magnetized ferrimagnetic racetrack layer, a tunneling barrier layer disposed on the racetrack layer and a reference layer including a perpendicular magnetic alloy. The racetrack layer, the tunneling layer and the reference layer have a channel portion and contact pad portions. First and second contacts are provided over the contact pad portions, and a third contact is provided over the channel portion, wherein the first and second contacts are electrically isolated from the third contact.

Heusler-alloy and ferrimagnet based magnetic domain-wall devices for artificial neural network applications

Embodiments of the invention include a method for fabricating a semiconductor device and the resulting structure. A substrate is provided. A plurality of metal portions are formed on the substrate, wherein the plurality of metal portions are arranged such that areas of the substrate remain exposed. A thin film layer is deposited on the plurality of metal portions and the exposed areas of the substrate. A dielectric layer is deposited, wherein the dielectric layer is in contact with portions of the thin film layer on the plurality of metal portions, and wherein the dielectric layer is not in contact with portions of the thin film layer on the exposed areas of the substrate such that one or more enclosed spaces are present between the thin film layer on the exposed areas of the substrate and the dielectric layer.

Thin film device with protective layer

A technique relates to a semiconductor device. First metal contacts are formed on top of a substrate. The first metal contacts are arranged in a first direction, and the first metal contacts are arranged such that areas of the substrate remain exposed. Insulator pads are positioned at predefined locations on top of the first metal contacts, such that the insulator pads are spaced from one another. Second metal contacts are formed on top of the insulator pads, such that the second metal contacts are arranged in a second direction different from the first direction. The first and second metal contacts sandwich the insulator pads at the predefined locations. Surface-sensitive conductive channels are formed to contact the first metal contacts and the second metal contacts. Four-terminal devices are defined by the surface-sensitive conductive channels contacting a pair of the first metal contacts and contacting a pair of the metal contacts.

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Ossining, NY, United States of America

Ching-Tzu Chen