Industrial Technology Research Institute

Ching-Sung Hsiao

Jau-Chyn Huang

Ting-Wei Huang

Kong-Wei Cheng

Yi-Ping Lin

Ching-Chen Wu

Tai-Chou Lee

Chih-Yung Huang

Jung-Yu Li

Shih-Pu Chen

Chen-Wen Tsai

Heng-Ju Lin

Ju-Chia Kuo

Ming-Shiann Shih

Pei-Shan Yen

Wen-Liang Huang

Jung Yu Li

A method and apparatus are provided for growing a composite metal sulphide photcatalyst thin film, wherein photochemical deposition and chemical bath deposition are both performed for growing the composite metal sulphide thin film, such as (AgInS)/(ZnS), wherein x is 0-1.

Method and apparatus for growing a composite metal sulfide photocatalyst thin film

Method and apparatus for growing a composite metal sulphide photocatalyst thin film

A field emission device includes a substrate, a first conductive layer formed over the substrate biased at a first voltage level, a second conductive layer formed over the substrate biased at a second voltage level different from the first voltage level, emitters formed on the first conductive layer and the second conductive layer for transmitting electrons, and a phosphor layer formed over the substrate and being disposed between the first conductive layer and the second conductive layer, wherein the electrons are transmitted from one of the first conductive layer and the second conductive layer through the phosphor layer to the other of the first conductive layer and the second conductive layer in a direction substantially orthogonal to the normal direction of the substrate.

Field emission device and operating method for field emission device

A plasma reformer includes a first electrode, a second electrode, an insulating member, an atomizing device and a power supply. A discharge gap is defined between the first electrode and the second electrode. The insulating member is arranged between the first electrode and the second electrode to insulating the first electrode and the second electrode, and a vortex gas flow route is formed between the insulating member and the first electrode, the second electrode. The second electrode penetrates the insulating member. The atomizing device is arranged on the first electrode and/or the second electrode. The power supply is connected with the first electrode and the second electrode.

Plasma reformer and internal combustion engine system having the same

An enhanced plane light source has a luminescent layer independently disposed in each recess formed on a light-transmittable substrate, so that field emission electrons directly impact the luminescent layer to produce light, which is not shielded by the cathode. The enhanced plane light source also includes a substrate forming a bottom structure thereof. The bottom substrate has a metal reflection surface to increase the reflectivity and upgrade light-emitting efficiency and luminous intensity. The recesses on the light-transmittable substrate have an approximate semi-circular or semi-parabolic cross section to increase the high field region at the cathode and the effective luminescent area at the anode, so that the luminous intensity and evenness are also largely increased.

Enhanced plane light source

The present invention discloses a hydrogen storage medium including a composite of an alloy and a catalyst/expandable graphite. The expandable graphite can be replaced by activated carbon. The catalyst content is 1-50% based on the weight of the medium, which can be Pd, Pt, Cu, Co or Ni. The alloy can be a Mg-based alloy, Ti-based alloy, La-based alloy, Mn-based alloy or Fe-based alloy. The present invention also discloses a process for preparing a hydrogen storage composite.

Hydrogen storage composite and preparation thereof

A plasma generating device, has a plurality of cavities shaped like half-ellipsoids, a plasma cavity, and microwave sources. The present invention takes advantage of geometrical properties of the propagation of electromagnetic waves by enclosing an electromagnetic field in the microwave range in overlapping cavities that together are shaped like a plurality of half ellipsoids. Each of the cavities has a first focus and a second focus, with the first foci of the cavities place close to each other. Microwaves entering the cavities at the second foci propagate inside the cavity and are focused at the first foci. The area around the first foci of both half ellipsoids forms a plasma cavity, providing a large volume filled with a microwave field. Thereby an increased volume of an electromagnetic field and thus of a plasma is achieved.

Multiple elliptical ball plasma apparatus

A microwave plasma processing apparatus is provided, which includes a microwave generator, a plasma promoter, a microwave plasma processing chamber, a vacuum gas-discharging chamber, and a loading elevator, wherein microwave produced from the microwave generator is gradually transformed into a desirable mode through the use of a microwave coupling resonator, and processing gas supplied by a gas supply system is evenly introduced via slantwise gas outlets of an annular gas distribution panel into the microwave processing chamber. The microwave is used to induce the processing gas to form a plasma sphere in the microwave plasma processing chamber; by reducing pressure in the microwave plasma processing chamber via the vacuum gas-discharging chamber, a vapor deposition process can be performed on a sample disposed on a sample holder of the loading elevator.

Microwave plasma processing apparatus

Porous ceramic composition comprises 24-45 wt % of gairome, 25-45 wt % of chamotte, 2-10 wt % of low thermal expansivity component, 2-10 wt % of mineralizing agents, and 15-30 wt % of at least two kinds of organic components which provide porosity. The porous ceramic radiation plate is produced by sintering the composition, and the end result is a product that is high in quality and has an efficient thermal radiation transfer.

Growing community of inventors

Hsinchu, Taiwan

Ching-Sung Hsiao