Taiwan Semiconductor Manufacturing Comp. Ltd.

Ching-Hsing Chiang

Chia-Hung Chu

Chih-Hsien Hsu

Hong-Hsing Chou

Hu-Wei Lin

Hua-Kuang Teng

Yuan-Ting Huang

Tsung-Cheng Huang

Yen-Chen Lin

Jr-Wei Ye

Chi-Jen Hsieh

Carolina Poe

A method includes rotating a wafer at a first speed for a first time duration. The wafer is rotated at a second speed that is lower than the first speed for a second time duration after the first time duration. The wafer is rotated at a third speed that is higher than the second speed for a third time duration after the second time duration. A photoresist is dispensed on the wafer during the first time duration and at least a portion of a time interval that includes the second time duration and the third time duration.

Photoresist coating scheme

Growing community of inventors

Hsin-Chu, Taiwan

Ching-Hsing Chiang