Hon Hai Precision Industry Co., Ltd.

Ching-Chou Chang

Bor-Yuan Hsiao

Chi-Chuang Ho

Ga-Lane Chen

Chung-Pei Wang

Chia-Ying Wu

A rolling machine includes a first clipping component, a second clipping component, a lifting component, and a holding assembly. The first clipping component has a first surface and a second surface opposite to the first surface. The second clipping component has a third surface configured to contact the first surface and a fourth surface opposite to the third surface. The lifting component is connected to the first clipping component and configured to drive the first clipping component to move back and forth. The holding assembly has a first and second holders configured to be symmetrically positioned on both sides of the first clipping component.

Rolling machine

An exemplary film coating device includes a film coating holder and a film coating cover. The film coating holder includes a plurality of through holes defined therein for receiving workpieces to be coated. The film coating cover includes a first cover body and a second cover body. The first cover body includes a frame and a plurality of arms. A plurality of shelter pieces is set on the inner side of each arm. Each shelter piece is spatially arranged corresponding to one of the plurality of through holes. The second cover body is configured for covering the first cover body. The height of the second cover body is no less than that of the first cover body.

Film coating cover and film coating device using same

An apparatus for manufacturing carbon nanotubes includes: a reaction chamber having an inlet at a bottom and an opposite outlet at a top thereof, and a substrate region configured for accommodating a substrate for growing carbon nanotubes thereon; an electric field generating device configured for generating an electric field around the substrate region, the electric field being substantially perpendicular to the substrate; and a magnetic field generating device configured for generating a magnetic field around the substrate region, the magnetic field being substantially perpendicular to the substrate.

Apparatus for manufacturing carbon nanotubes

A method for removing a protective film from a surface of an article is provided. The protective film includes a primary protective layer (e.g., a diamond-like carbon layer) and a transition layer, the transition layer being formed directly upon the surface of the article and thereby facilitating an attachment/bond of the protective film to the article. The method includes the step of: disposing/placing the article having the protective film in a reaction chamber; bombarding the protective film (especially, the primary protective layer) with oxidative plasma beams along an edge portion of the protective film, the bombarding occurring until the transition layer in particular is exposed; and bombarding the transition layer with oxidative plasma beams to damage a configuration of the transition layer, thereby making it possible to remove the protective film.

Method for removing protective film on article

A method for manufacturing carbon nanotubes with a desired length includes the steps of: providing an array of carbon nanotubes; placing a mask having at least an opening defined therein on the array of carbon nanotubes, with at least one portion of the array of carbon nanotubes being at least partially exposed through a corresponding opening of the mask; forming a protective film on at least one exposed portion of the array of carbon nanotubes; removing the mask from the array of the carbon nanotubes, with the carbon nanotubes being compartmentalized into at least a first portion covered by the protective film and at least one uncovered second portion; breaking/separating the first portion from the second portion of the array of the carbon nanotubes using a chemical method, thereby obtaining at least a carbon nanotube segment with a protective film covered thereon; and removing the protective film from the carbon nanotube segment.

Method for manufacturing carbon nanotubes with desired length

An apparatus for manufacturing carbon nanotubes is provided. The apparatus includes: a reaction chamber having an inlet and a outlet; a heater for elevating an interior temperature of the reaction chamber; and a gas guiding member coupled to the inlet and configured for introducing a carbon-containing gas into the reaction chamber, the gas guiding member including a gas-exiting portion arranged in the reaction chamber, the gas-exiting portion having a cavity defined therein and a flat perforated top wall, the perforated top wall being configured for supporting a substrate thereon and defining a route allowing the introduced carbon-containing gas to flow in a direction substantially perpendicular to a main plane of the substrate.

An optical filter for screening out infrared and ultraviolet light includes a transparent substrate and a film stack formed on the substrate. The film stack includes a number of high refractive index layers and a number of low refractive index layers alternately stacked one on another. The film stack is represented as follows: (3.5H3.5L)(2.5H2.5L)(HL)(0.76H0.76L), wherein, H represents a high refractive index layer having a base optical thickness equal to one fourth of a reference wavelength associated with the optical filter, L represents a low refractive index layer having a base optical thickness equal to one fourth of a reference wavelength associated with the optical filter, expressions enclosed in each parenthesis represent filter cavities, and superscripts represents the number of repetitions of the expression enclosed in that parenthesis.

Optical filter for screening out infrared and ultraviolet light

An optical filter includes a transparent substrate, a first film stack and a second film stack. The first and second film stacks each includes a number of high refractive index layers and a number of low refractive index layers alternately stacked one on another. The first film stack is defined as (HL)(0.76H0.76L), and the second film stack is defined as 0.5(HL)(1.3H1.3L)(HL), wherein, H represents a high refractive index layer having a base optical thickness equal to one fourth of a first reference wavelength associated with the optical filter, L represents a low refractive index layer having a base optical thickness equal to one fourth of a first reference wavelength associated with the optical filter, the expression enclosed in each parenthesis represents a filter cavity, and the superscript represents the number of repetition of the expression enclosed in that parenthesis.

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Tu-Cheng, Taiwan

Ching-Chou Chang