Taiwan Semiconductor Manufacturing Comp. Ltd.

Moxa Inc.

Ching-Chih Chuang

Hao-Ming Chang

Hsiao-Chen Li

Ai-Chun Pang

Tzu-Hsien Yu

Chung-wei Lin

A method includes: providing a photomask used in extreme ultra violet (EUV) lithography; receiving information of the photomask; determining a bias voltage of an electron beam writer system according to the information; and performing a repairing operation on the photomask by the electron beam writer system with the bias voltage.

Photomask repairing method and system thereof

A method includes: providing a photomask, wherein the photomask includes a multilayer stack, a light-absorption layer, an anti-reflection coating and a light-absorption layer. The method further includes: receiving information on the photomask; determining a bias voltage according to the information; determining a scan recipe of an electron beam writer system based on the bias voltage; and performing a repairing operation on at least one of the anti-reflection coating and the light-absorption layer by the electron beam writer system with the scan recipe.

Growing community of inventors

Hsinchu, Taiwan

Ching-Chih Chuang