United Microelectronics Corp.

Ching-Chih Cheng

Kuo-Feng Huang

Kuei-Hsi Lai

Hung-Lung Ma

Ming-Che Yang

Hsien-Jung Hsu

En-Tien Tan

Hsi-Huang Lee

Wen-Liang Fang

Shih-Hsun Chiou

Kuei-Si Lai

A spray nozzle resetting device comprises a spray nozzle for spraying resist onto a midpoint of a wafer, a rotary robotic arm that has a resist-delivering duct connected to the spray nozzle, a covering nut, a resetting ring, and a fixing ring. The covering nut has an opening of diameter D. The resetting ring has a rotary part of a diameter less than or equal to D, which fits in the opening of the covering nut, and at least two protrusions. The fixing ring, having two recesses that correspond to the two protrusions and interact with them, is used to connect the covering nut and the rotary robotic arm.

Nozzle reposition device used in a resist coating process

The present invention provides equipment for brushing the underside of a semiconductorwafer that is placed on a rotary wafer chuck. The equipment comprises a brush rod, a brush with a channel in it mounted at an end point of the brush rod, a nozzle for spraying water on the underside of the semiconductor wafer, and a driving device connected to the brush rod for driving the brush rod in a reciprocating motion. The wafer chuck rotates the semiconductor wafer and, simultaneously, water drives the blade and the brush to raise and rotate so as to spray water over the underside of the semiconductor wafer. The driving device drives the brush to brush the underside of the semiconductor wafer along a radial direction of the semiconductor wafer.

Equipment for brushing the underside of a semiconductor wafer

A liquid supplying device comprising a liquid container for storing a liquid so as to supply an external device and a liquid level sensor for detecting the liquid level. As the liquid within the liquid container is gradually used up, liquid level drops. As soon as the remaining liquid in the container drops to a predetermined amount, the liquid level sensor emits a warning signal to the operator, and the operator can then replenish the liquid in the container.

Liquid supplying device for providing chemical solution with a liquid level sensor

A SOG coater nozzle pot includes a pot for containing fluid and letting the fluid in the pot flow out, a funneled nozzle including a wider opening for receiving fluid from the pot and a narrower opening on a protuberance inserted into a duct, and a mounting device for mounting the funneled nozzle on the SOG coater. The nozzle pot according to the invention makes the mounting/dismounting operations of the pot more convenient and less time-consuming. The stability of the SOG coater is maintained as well.

SOG coater nozzle pot

A rinsing system used in a photoresist coater to remove a brim portion of the formed photoresist layer on a substrate. The rinsing system has capability to avoid a reversed pressure effect. The rinsing system includes several distribution ducts, which are coupled to a solvent container. Each duct includes an one-way valve, an automatically-releasing-gas filter, and a pump with sequential couplings from the solvent container. The pump is used to transport solvent to the substrate to rinse the photoresist layer. The pump also induces the reversed pressure effect, which can be avoided by the automatically-releasing-gas filter, the one-way valve, and the solvent container. The one-way valve includes a spring to hold a ball-like stopper of the valve so that the reversed pressure effect is consumed by the spring force. The automatically-releasing-gas filter contains a gas and includes a releasing-gas valve to release the gas. The solvent container also contain a gas with a pressure of about one atmospheric pressure. The reversed pressure effect is reduced by the pressure induced by the gases.

Growing community of inventors

Hsin-Chu, Taiwan

Ching-Chih Cheng