Kurita Water Industries Ltd.

Chikako Shimpo

Yukimasa Shimura

A device for controlling injection of chemical into a boiler and a chemical injection method can control an injection amount such that a chemical concentration is obtained as per a target even in a boiler feed-water facility where a flow rate of feed-water varies to a large extent in a short period. The device controls an amount discharged by a chemical injection pump in proportion to a flow rate measured by a flowmeter. An average chemical concentration in a feed-water is calculated from an amount of feed-water per predetermined period obtained by the flowmeter and a reduction in the amount of chemical in a tank per predetermined period obtained by a sensor. The chemical injection pump is controlled on the basis of the calculated average chemical concentration and a preset target chemical concentration of the feed-water so that the average chemical concentration is within the target chemical concentration range.

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Tokyo, Japan

Chikako Shimpo