Cmet Inc.

Chiharu Homma

Yuya Daicho

Nobuo Ogane

Eiji Nakamoto

A resin composition for optical stereolithography including a cation-polymerizable organic compound (A), a radical polymerizable organic compound (B), a cationic polymerization initiator (C) and a radical polymerization initiator (D), wherein the cationic polymerization initiator (C) is an aromatic sulfonium compound (C-1) represented by the following general formula (C-1): wherein R, R, and Rrepresent a monovalent organic group, Rf represents a fluoroalkyl group, m is the same number as the cationic charge of the 'cation [S(R)(R)(R)]', and n is an integer in a range of 0 to 6. The resin composition also includes an aromatic thiol compound (E) represented by the following general formula (E):RSH)&#x2003;&#x2003;(E)wherein, Rrepresents a mono- or di-valent aromatic hydrocarbon which may optionally have a substituent, and p is an integer of 1 or 2.

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Yokohama, Japan

Chiharu Homma