National Chung Hsing University

Chih-Yi Yang

Tung-Hsing Wu

Shuo-Huang Yuan

A method for repairing etching damage on a nitride-based epitaxial layer of an optoelectronic device and an optoelectronic device attributable thereto are provided. The method includes: providing a nitrogen-containing working liquid and a annealing apparatus having a reaction chamber; heating the reaction chamber to a predetermined temperature; atomizing the nitrogen-containing working liquid, and introducing the thus formed nitrogen-containing spray into the reaction chamber; and subjecting the optoelectronic device to an annealing treatment in the reaction chamber in the presence of the nitrogen-containing spray, so as to repair the etching damage on the nitride-based epitaxial layer.

Growing community of inventors

Taichung, Taiwan

Chih-Yi Yang