Qualcomm Mems Technologies, Inc.

Idc, LLC

Chih-Wei Chiang

Clarence Chui

Ming-Hau Tung

Lior Kogut

Denis H Endisch

Yeh-Jiun Tung

William J Cummings

Brian James Gally

Evgeni Petrovich Gousev

David Leslie Heald

Qi Luo

Thanh Nghia Tu

Chia Wei Yang

A microelectromechanical (MEMS) device includes a substrate, a movable element over the substrate, and an actuation electrode above the movable element. The movable element includes a deformable layer and a reflective element. The deformable layer is spaced from the reflective element.

Electromechanical device with optical function separated from mechanical and electrical function

Methods of making a microelectromechanical system (MEMS) device are described. In some embodiments, the method includes forming a sacrificial layer over a substrate, treating at least a portion of the sacrificial layer to form a treated sacrificial portion, forming an overlying layer over at least a part of the treated sacrificial portion, and at least partially removing the treated sacrificial portion to form a cavity situated between the substrate and the overlying layer, the overlying layer being exposed to the cavity.

Eliminate release etch attack by interface modification in sacrificial layers

A microelectromechanical (MEMS) device includes a first reflective layer, a movable element, and an actuation electrode. The movable element is over the first reflective layer. The movable element includes a deformable layer and a reflective element. The actuation electrode is between the deformable layer and the reflective element.

Microelectromechanical device with optical function separated from mechanical and electrical function

A microelectromechanical systems (MEMS) device utilizing an aluminum fluoride layer as an etch stop is disclosed. In one embodiment, a MEMS device includes a first electrode having a first surface; and a second electrode having a second surface facing the first surface and defining a gap therebetween. The second electrode is movable in the gap between a first position and a second position. At least one of the electrodes includes an aluminum fluoride layer facing the other of the electrodes. During fabrication of the MEMS device, a sacrificial layer is formed between the first and second electrodes and is released to define the gap. The aluminum fluoride layer serves as an etch stop to protect the first or second electrode during the release of the sacrificial layer.

Aluminum fluoride films for microelectromechanical system applications

Growing community of inventors

Hsin-Chu, Taiwan

Chih-Wei Chiang