Nan Ya Technology Corporation

Chih-Wang Hsu

Chih-Yuan Chen

Chia-Hung Su

Jiun-Bo Wang

Yuan-Chi Hsieh

Ming-Fa Tsai

A polishing delivery apparatus, configured to provide slurry and rinse agent to a polishing pad, includes a delivery arm, at least one first nozzle, and at least one second nozzle. The delivery arm is rotatably connected to the polishing pad and has an arc-shaped top surface facing away from the polishing pad, a bottom surface facing away from the arc-shaped top surface, and a recess indenting from the bottom surface. The first nozzle is mounted on the bottom surface of the delivery arm and has a first nozzle head facing toward the polishing pad. The second nozzle is mounted in the recess of the delivery arm and has three second nozzle heads, in which one of the three second nozzle heads faces toward the polishing pad, and the other two of the three second nozzle heads face toward sidewalls of the recess.

Growing community of inventors

Taipei, Taiwan

Chih-Wang Hsu