Taiwan Semiconductor Manufacturing Comp. Ltd.

Chih-ming Tsao

Tzu-Sou Chuang

Po-Cheng Chen

Deng-an Wang

Kuo-cheng Huang

A system includes a semiconductor apparatus configured to process a workpiece, a mist generator configured to generate a mist and a particle separator configured to receive an exhaust gas generated by the semiconductor apparatus. The particle separator includes a first fan, wherein the first fan includes a plurality of blades. Each of the plurality of blades includes holes allowing the exhaust gas and the mist to pass through.

Particulate matter filtration apparatus and method thereof

A semiconductor fabrication building is provided. The semiconductor fabrication building includes an ambient control surrounding and a makeup air handling unit configured to supply clean air to the ambient control surrounding. The makeup air handling unit includes a housing having an air inlet and an air outlet. The makeup air handling unit also includes a first filtration module positioned in the housing. The first filtration module includes a number of hollow fibers configured to guide air to flow from the air inlet to the air outlet. A porous layer is formed at an inner wall of each of the hollow fibers to filter airborne molecular contamination (AMC) having a selected size.

Makeup air handling unit in semiconductor fabrication building and method for cleaning air using the same

A system for processing a semiconductor wafer is provided. The system includes a processing tool. The system also includes gas handling housing having a gas inlet and a gas outlet. The system further includes an exhaust conduit fluidly communicating with the processing tool and the gas inlet of the gas handling housing. In addition, the system includes at least one first filtering assembly and at least one second filtering assembly. The first filtering assembly and the second filtering assembly are positioned in the gas handling housing and arranged in a series along a flowing path that extends from the gas inlet to the gas outlet of the gas handling housing. Each of the first filtering assembly and the second filtering assembly comprises a plurality of wire meshes stacked on top of another.

Particle removal method in semiconductor fabrication process

A method of monitoring a semiconductor fabrication facility and a semiconductor fabrication facility are provided. The method includes collecting an ambient air in a clean room through a plurality of gas lines with their gas inlets arranged at a plurality of sampling positions in the clean room. The method also includes measuring a parameter of the ambient air by a plurality of metrology devices which are connected to the gas lines. At least two of the sampling positions are measured simultaneously. The method further includes issuing a warning when the parameter detected by the metrology devices is outside a range of acceptable values.

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MIAOLI COUNTY, Taiwan

Chih-ming Tsao