Taiwan Semiconductor Manufacturing Comp. Ltd.

Chih-hung Lu

Yen-Ming Chen

Dian-Hau Chen

Chih-Fan Huang

Hui-Chi Chen

Chih-Sheng Li

Semiconductor devices, integrated circuits and methods of forming the same are provided. In one embodiment, a method includes depositing a first dielectric layer over a metal pad disposed over a workpiece, forming a first opening in the first dielectric layer to expose a portion of the metal pad, after the forming of the first opening, forming a second dielectric layer over the exposed portion of the metal pad, depositing a first polymeric material over the second dielectric layer, forming a second opening through the first polymeric material and the second dielectric layer to expose the metal pad, and forming a bump feature over the exposed metal pad.

Growing community of inventors

Hsinchu County, Taiwan

Chih-hung Lu