Taiwan Semiconductor Manufacturing Comp. Ltd.

Chih-Hua Chan

Yu-Pei Chiang

Yin-Tun Chou

Jr-Sheng Chen

Chin-Han Meng

Lin-Ching Huang

A multi-zone gas distribution plate (GDP) for high uniformity in plasma-based etching is provided. A housing defines a process chamber and comprises a gas inlet configured to receive a process gas. A GDP is arranged in the process chamber and is configured to distribute the process gas within the process chamber. The GDP comprises a plurality of holes extending through the GDP, and further comprises a plurality of zones into which the holes are grouped. The zones comprise a first zone and a second zone. Holes of the first zone share a first cross-sectional profile and holes of the second zone share a second cross-sectional profile different than the first cross-sectional profile. A method for designing the multi-zone GDP is also provided.

Growing community of inventors

Hsinchu, Taiwan

Chih-Hua Chan