United Microelectronics Corp.

Chih-Hsing Hsin

Chi-Fa Ku

Wen-Bin Shieh

Po-Wen Yen

A vernier having multi-pitch for checking alignment accuracy. The vernier has the same pitch as the line width of the IC pattern where the diffraction angle of the vernier is the same as that of the IC pattern. The pitch comprises slits which cannot produce image on the wafer, such that a simultaneous pattern with the conventional pattern on the wafer is formed. Accordingly, the alignment accuracy can be accurately checked, thereby monitoring the alignment of IC patterns.

Multi-pitch vernier for checking alignment accuracy

A method for applying photoresist on a wafer is disclosed. The method comprises: lowering the temperature of the photoresist, and dispensing the photoresist on a portion of the wafer, where the wafer is supported by a spinner chuck and is rotated at a low speed. Thereafter, spreading the photoresist on the wafer by rotating the wafer at a high speed. Finally, planarizing the photoresist by rotating the wafer at a medium speed greater than or equal to the low speed in the dispensing step and less than or equal to the high speed in the spreading step.

Growing community of inventors

Hsinchu Hsien, Taiwan

Chih-Hsing Hsin