Mosel Vitelic Corporation

Aten International Co., Ltd.

Chih-Hsien Chang

Pei-Wei Tsai

Kevin Chen

Hua-Jen Tseng

Dong-Tay Tsai

Yi-Hua Chin

Huan-Jen Tseng

A keyboard, video and mouse (KVM) switch comprises an enclosure; a switching circuit contained within the enclosure; a set of connector ports disposed on the enclosure and electrically coupled to the switching circuit; a set of plugs electrically coupled to the switching circuit, the set of plugs comprising: a video plug disposed on the enclosure for directly coupling to a video port of a first computer system; and at least one peripheral plug attached to the enclosure for coupling to at least one peripheral port of the first computer system; and a cable connector electrically coupled to the switching circuit, for coupling to a second computer system via a detachable cable; wherein the switching circuit switches to operatively couple each connector port to the set of plugs and the cable connector.

Keyboard, video and mouse (KVM) switch

The present invention relates to an ion source chamber of a high energy implanter. The ion source chamber comprises a main chamber for generating ions for ion implantation, a vent-pipe having two open ends, one end of the vent-pipe being connected to the main chamber for releasing air from the main chamber, a releasing valve connected to another end of the vent-pipe for releasing the air in the main chamber when the pressure of the air in the main chamber exceeds a predetermined pressure, and a filtering device installed between the vent-pipe and the releasing valve for filtering impurities contained in the air carried by the vent-pipe so as to prevent the impurities from falling into the releasing valve.

Ion source chamber of a high energy implanter with a filtering device

The present invention provides a control device for maintaining a chemical mechanical polishing (CMP) machine in a wet mode, the CMP machine comprising a polishing pad, a slurry sprinkler for sprinkling liquid or deionized water, and at least one carrier head, the control device comprising a sensor positioned on the CMP machine for sensing the operational status of the slurry sprinkler and generating a corresponding sensing signal; and a control unit electrically connected to the sensor for measuring the time period over which the slurry sprinkler is closed wherein when the measured time period exceeds a predetermined length, the control unit will either send a warning signal or turn on the slurry sprinkler to sprinkle liquid onto the polishing pad according to a predetermined process so as to maintain the polishing pad in a wet mode.

Control device for maintaining a chemical mechanical polishing machine

Growing community of inventors

Taipei Hsien, Taiwan

Chih-Hsien Chang