Massachusetts Institute of Technology

Chih-Hao Chang

George Barbastathis

Gareth H McKinley

Hyungryul Johnny Choi

Jeong-gil Kim

Kyoo Chul Park

Fabrication method. At least first and second hardmasks are deposited on a substrate, the thickness and materials of the first and second hardmask selected to provided etch selectivity with respect to the substrate. A nanoscale pattern of photoresist is created on the first hardmask and the hardmask is etched through to create the nanoscale pattern on a second hardmask. The second hardmask is etched through to create the desired taper nanocone structures in the substrate. Reactive ion etching is preferred. A glass manufacturing process using a roller imprint module is also disclosed.

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Cambridge, MA, United States of America

Chih-Hao Chang