Semiconductor Manufacturing International (Shanghai) Corporation

Chih Chun Tai

Lei Fang

Gangning Wang

Guangli Yang

Dae Sub Jung

Hong Sun

Jiao Wang

Yunpeng Peng

The present disclosure provides a method for forming a semiconductor structure. The method includes providing a semiconductor substrate; forming a first active region, a second active region, a third active region, and a fourth active region in the semiconductor substrate; and forming a middle-voltage P well region (MVPW) in each of the first active region and the second region simultaneously and forming a middle-voltage N well (MVNW) region in each of the third active region and the fourth active region simultaneously.

Semiconductor structure and fabrication method thereof

Growing community of inventors

Shanghai, China

Chih Chun Tai