Taiwan Semiconductor Manufacturing Comp. Ltd.

Chih-Chiang Tseng

Chwen Yu

Tzu-Sou Chuang

Yung-Long Chen

En Tian Lin

Ming-Lee Lee

I-Chen Chiang

Hwai-Te Chiu

Chiang Jen Chen

Yi-Tsang Chen

A filter device includes one or more filter membranes, and a filter housing enclosing the one or more filter membranes. Each of the filter membranes includes a base membrane and a plurality of through holes.

Filter apparatus for semiconductor device fabrication process

A system includes a chemical storage tank, a pipeline, a pump, a first electrostatic probe, and a control unit. The pipeline is connected to the chemical storage tank. The pump is connected to the pipeline and configured to pump a chemical solution from the chemical storage tank into the pipeline. The first electrostatic probe is coupled to the pump and configured to measure an electrostatic voltage of the pump. The control unit is coupled to the first electrostatic probe and configured to obtain a measurement of an electrostatic voltage from the first electrostatic probe.

System for supplying chemical solution

A slurry dispersion system is provided, and includes a slurry source system, an in-line analyzer and a controller. The slurry source system provides a slurry for a chemical mechanical polishing (CMP) process. The in-line analyzer measures at least one parameter of a sampled slurry sampled from the slurry dispersion system, and generates an indication signal based on the parameter, in which the indication signal indicates at lease one characteristic of the slurry. The controller receives the indication signal, and generates a control signal based on the indication signal for performing a real time control on the slurry dispersion system for controlling quality of the slurry.

Slurry dispersion system with real time control

Growing community of inventors

Hsinchu County, Taiwan

Chih-Chiang Tseng