Realtek Semiconductor Inc.

Winbond Electronics Corporation

Chien-Ting Chen

Hsiu-Han Liao

Yao-Ting Tsai

Chih-Jung Chiang

Ying-An Huang

Meng-Hung Tsai

Sih-Han Chen

A method for forming a self-aligned contact includes providing a substrate with a plurality of gate structures formed on the substrate. The method also includes forming a spacer liner on the gate structures and the substrate. The method also includes forming a sacrificial layer between the gate structures and on the gate structures. The method also includes forming a plurality of dielectric plugs through the sacrificial layer above the gate structures. The method also includes removing the sacrificial layer to form a plurality of contact openings between the gate structures. The method also includes forming an etch resistant layer conformally covering the sidewall and the bottom of the contact openings. The method also includes forming a plurality of contact plugs in the contact openings.

Self-aligned contact and method for forming the same

A network communication method used in a network communication apparatus is provided that includes the steps outlined below. An external network communication apparatus is electrically coupled through a communication path. A communication capability packet is transmitted to the external network communication apparatus. Whether an acknowledgement packet from the external network communication apparatus is received through the communication path is determined. When the acknowledgement packet is not received, a single direction communication is performed within any single time period by using a time division communication mechanism such that an auto negotiation process is performed by exchanging the communication capability packet and the acknowledgement packet of both of the network communication apparatus and the external network communication apparatus.

Network communication apparatus and method of the same

Growing community of inventors

Tainan, Taiwan

Chien-Ting Chen