Average Co-Inventor Count = 2.60
ph-index = 11
The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.
Company Filing History:
1. Idaho Research Foundation, Inc. (19 from 110 patents)
2. Micron Technology Incorporated (9 from 37,905 patents)
3. Battelle Memorial Institute (3 from 2,362 patents)
4. Other (1 from 832,680 patents)
5. The United States of America As Represented by the United States (1 from 3,975 patents)
6. Battelle Energy Alliance, LLC (1 from 572 patents)
7. Areva Np Gmbh (1 from 211 patents)
8. University of Idaho (1 from 42 patents)
9. Lcw Supercritical Technologies Corporation (1 from 1 patent)
30 patents:
1. 11718539 - Extraction and recovery of Pd from aqueous solutions
2. 11247917 - Extracting metals from fresh water with amidoxime-carboxylate adsorbents
3. 10570027 - Converting acrylic fibers to amidoxime-carboxylate containing polymer adsorbents for sequestering uranium and other elements from water
4. 10533239 - Methods of recovering rare earth elements from a material
5. 9676944 - Methods of increasing the solubility of materials in supercritical carbon dioxide
6. 8912238 - Compositions comprising supercritical carbon dioxide and metallic compounds
7. 8241708 - Formation of insulator oxide films with acid or base catalyzed hydrolysis of alkoxides in supercritical carbon dioxide
8. 7897517 - Method of selectively depositing materials on a substrate using a supercritical fluid
9. 7686865 - Method and system for recovering metal from metal-containing materials
10. 7582561 - Method of selectively depositing materials on a substrate using a supercritical fluid
11. 7423345 - Semiconductor constructions comprising a layer of metal over a substrate
12. 7400043 - Semiconductor constructions
13. 7341947 - Methods of forming metal-containing films over surfaces of semiconductor substrates
14. 7128840 - Ultrasound enhanced process for extracting metal species in supercritical fluids
15. 6653236 - Methods of forming metal-containing films over surfaces of semiconductor substrates; and semiconductor constructions