Taiwan Semiconductor Manufacturing Comp. Ltd.

Hiwin Technologies Corporation

Chien-Hung Lai

Jong-Yuh Chang

Chih-Chiang Tu

Biow-Hiem Ong

Hao-Ming Chang

Chih-Wei Wang

Chia-Shih Lin

Hsuan-Wen Wang

Chien-Hsiang Tsai

Kuang-Yu Liu

Chih-Tsung Shih

Cheng-Ming Lin

Chun-Jen Chen

Yuan-Chih Chu

Shao-Chi Wei

Yu-Hsin Hsu

Min-An Yang

Yu-Hsun Wu

Chung-Sheng Hsu

Meng-Lin Lu

Ching-Ting Yang

S C Hsu

A photomask includes a substrate, a multilayer stack disposed over the substrate and configured to reflect a radiation, a capping layer over the multilayer stack, and an anti-reflective layer over the capping layer. The anti-reflective layer comprises a first pattern, wherein the first pattern exposes the capping layer and is configured as a printable feature. The photomask also includes an absorber spaced apart from the printable feature from a top-view perspective.

Photomask with enhanced contamination control and method of forming the same

A method of manufacturing a mask includes depositing an end-point layer over a light transmitting substrate, depositing a phase shifter over the end-point layer, depositing a hard mask layer over the phase shifter, and removing a portion of the hard mask layer and a first portion of the phase shifter to expose a portion of the end-point layer. The end-point layer and the light transmitting substrate are transparent to a predetermined wavelength.

Photomask and fabrication method therefor

A headstock assembly for a machine tool includes a mount having a female threaded bore, a headstock mounted slidably relative to the machine base, a drive member mounted on the headstock, a spindle, and a spindle extension. The spindle has an intermediate segment disposed in a chamber of the headstock and coupled to be driven by the drive member so as to permit the spindle to rotate about a spindle axis. The spindle extension is coupled to be rotatable with the spindle, and has a male threaded segment configured to be in threaded engagement with the female threaded bore so as to permit the headstock to be linearly moved relative to the mount.

Headstock assembly for machine tool

A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect candidates. The method further includes applying a second test regimen to the manufactured product to identify product defects. The second test regimen produces a second set of defect candidates, and the second test regimen is different from the first test regimen. The method also includes generating a first filtered defect set by eliminating ones of the first set of defect candidates that are not identified in the second set of defect candidates.

Systems and methods eliminating false defect detections

The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.

Image process method to improve mask inspection performance

An angle-adjustable thread processing machine includes a base, a rocker arm, a rocker-arm toothed wheel, an idle wheel, a driven toothed wheel, and a processing unit. The base includes a power source with a drive shaft. The rocker arm is fixed to the drive shaft which rotates about a drive axis. The rocker-arm toothed wheel is pivotally sleeved on the drive shaft. The idle wheel is pivotally disposed on the rocker arm and engaged with the rocker-arm toothed wheel. The driven toothed wheel is pivotally disposed on the rocker arm to engage with the idle wheel and rotates around a driven axis which is located a first distance Dfrom the drive axis. The processing unit includes a machining spindle fixed to the driven toothed wheel, and a machining head which rotates around a machining-head axis which is located a second distance Dfrom the driven axis, and DD

Angle-adjustable thread processing machine

A method for inspecting a manufactured product includes applying a first test regimen to the manufactured product to identify product defects. The first test regimen produces a first set of defect candidates. The method further includes applying a second test regimen to the manufactured product to identify product defects. The second test regimen produces a second set of defect candidates, and the second test regimen is different from the first test regimen. The method also includes generating a first filtered defect set by eliminating ones of the first set of defect candidates that are not indentified in the second set of defect candidates.

A method of forming a standard mask for an inspection system is provided, the method comprising providing a substrate within a chamber, and providing a tetraethylorthosilicate (TEOS) precursor within the chamber. The method further includes reacting the TEOS precursor with an electron beam to form silicon oxide particles of controlled size at one or more controlled locations on the substrate, the silicon oxide particles disposed as simulated contamination defects.

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Taichung, Taiwan

Chien-Hung Lai