Industrial Technology Research Institute

Chien-Hsun Chu

Chieh-Wei Feng

Tzu-Yang Ting

Tzu-Hao Yu

Wei-Yuan Cheng

Ming-Huan Yang

Tai-Jui Wang

Shu-Wei Kuo

Chen-Tsai Yang

Yu-Hua Chung

Jui-Wen Yang

Shao-An Yan

Shau-Fei Cheng

Yun-Yi Huang

Hsin-Cheng Lai

Chien-Chou Tseng

Provided is a forming method of a redistribution structure including: forming a first redistribution layer and a first compensation circuit layer on a substrate, wherein the first compensation circuit layer surrounds the first redistribution layer, and the first compensation circuit layer and the first redistribution layer are electrically insulated from each other; forming a first dielectric layer on the first redistribution layer and the first compensation circuit layer; and forming a second redistribution layer and a second compensation circuit layer on the first dielectric layer, wherein the second compensation circuit layer surrounds the second redistribution layer, the second compensation circuit layer and the second redistribution layer are electrically insulated from each other, the second compensation circuit layer is connected to the first compensation circuit layer, and the second redistribution layer is connected to the first redistribution layer.

Redistribution structure and forming method thereof

A weight training method, a weight training apparatus and a weight training system are provided. In the method, a weight of a load of a user operating the weight training apparatus is detected by a load sensor, a motion of the load is detected by an activity sensor, and thereby an operation power of the weight training apparatus is calculated. A force applied by the muscle portion when the user operates the weight training apparatus is detected by at least one biophysical quantity sensor disposed on at least one muscle portion of the user and used to calculate an energy power consumed by the user. An exercise efficiency value of the user is calculated by using the energy power and the operation power, and the user is prompted to adjust an operation performed on the weight training apparatus when the exercise efficiency value drops beyond a preset ratio.

Weight training method, apparatus and system

A redistribution structure including a first redistribution layer is provided. The first redistribution layer includes a dielectric layer; at least one conductive structure located in the dielectric layer, wherein the at least one conductive structure has a width L; and at least one dummy structure located adjacent to the at least one conductive structure and located in the dielectric layer, and the at least one dummy structure has a width D, wherein there is a gap width S between the at least one dummy structure and the at least one conductive structure, and a degree of planarization DOP of the first redistribution layer is greater than or equal to 95%, wherein DOP=[1&#x2212;(h/T)]*100%, and h refers to a difference between a highest height and a lowest height of a top surface of the dielectric layer; and T refers to a thickness of the at least one conductive structure.

A panel to be plated is provided. The panel includes a substrate and an electric field compensation structure. The substrate includes a plurality of units to be plated each including a first pattern to be plated. The electric field compensation structure is disposed on the substrate. The electric field compensation structure includes a second pattern to be plated surrounding at least one of the units to be plated. A ratio of an area of the first pattern to be plated of the units to be plated to an area of the second pattern to be plated of the electric field compensation structure is in a range from 1:0.07 to 1:0.3.

Panel to be plated, electroplating process using the same, and chip manufactured from the same

Growing community of inventors

Kaohsiung, Taiwan

Chien-Hsun Chu