Alliedsignal Inc.

Allied Chemical Corporation

Chien C Li

Kane David Cook

Rajat S Basu

Bernard F Sukornick

Richard E Eibeck

Michael Van Der Puy

David Paul Wilson

Hillel Magid

Henry R Nychka

Leonard I Stiel

Stanley S Seelig

Alfred A Riederer

The present invention provides hydrochlorofluorocarbons having 3 to 5 carbons atoms, 1 to 2 chlorine atoms, and an OH rate constant from about 8 to about 25 cm.sup.3 /molecule/sec.times.10.sup.-14. The hydrochlorofluorocarbons are useful as solvents and blowing agents.

Hydrochlorofluorocarbons having OH rate constants which do not

The present invention provides a class of hydrochlorofluorocarbons having a tertiary structure, 5 carbon atoms, 1 chlorine atom, 6 to 8 fluorine atoms, and OH rate constants from about 8 to about 15 cm.sup.3 /molecule/secx10.sup.-14. The hydrochlorofluorocarbons are useful as solvents and blowing agents.

Method of cleaning using hydrochlorofluorocarbons having a tertiary

This invention relates to compositions comprising a volatile hydrochlorofluorocarbon such as 1,1-dichloro-1-fluoroethane and demulsifer. The compositions are effective as drying agents.

1,1-dichloro-1-fluoroethane dewatering systems

Novel partially fluorinated alkanes having the Formula: ##STR1## wherein each R is the same or different and is selected from the group consisting of CF.sub.3, CHF.sub.2, CH.sub.2 F, and CH.sub.3 CF.sub.2, and R' is an alkyl or fluoroalkyl group having 1 to 6 carbon atoms have utility as solvents in a variety of industrial cleaning applications including cold cleaning, dry cleaning, and defluxing of printed circuit boards.

Partially fluorinated alkanols having a tertiary structure

An improved cooling medium for use in a thermal energy storage system is disclosed. The cooling medium comprises water, 1-fluoro-1,1-dichloroethane (HCFC-141b), as the guest molecule and a surfactant selected from the group consisting of DRSC.RTM., EMPHOS PS-21A.RTM., MAPHOS L13.RTM., or MAZEEN C-Z.RTM., POE(2) COCOAMINE. It has been found that any of the above surfactants, and preferably DRSC.RTM. and EMPHOS PS-21A.RTM. encourage clathrate formation at surfactant concentrations far below 300 ppm. Clathrate formation, and the overall efficiency of the thermal energy storage system is increased when the cooling medium of the present invention is used.

Cooling medium for use in a thermal energy storage system

A method of cleaning a surface of a substrate is provided. The solvent is selected from a group consisting of hydrochlorofluorocarbons having 3 to 5 carbon atoms and a maximum of two chlorine atoms. The environmental lifetime of the solvent is expected to be less than one year.

Method of cleaning using hydrochlorofluorocarbons having 3 to 5 carbon

A method of cleaning a surface of a substrate is provided. The method comprises treating the surface with a solvent comprising 1-chloro-3,3,3-trifluoropropane.

Method of cleaning using 1-chloro-3,3,3-trifluoropropane

A method for preparing polyurethane and polyisocyanurate foams which comprises reacting and foaming a mixture of ingredients which will react to form the polyurethane or polyisocyanurate foams in the presence of a blowing agent comprising a partially fluorinated alkane having four or five carbon atoms and a tertiary structure. The method is advantageous because partially fluorinated alkanes having a tertiary structure have zero ozone depletion potentials, are nonflammable, and have higher solvency toward polyols.

Method of preparing foam using a partially fluorinated alkane having a

The present invention provides stabilized compositions comprising dichlorotrifluoroethane and effective stabilizing amounts of alkanol having 4 or 5 carbon atoms, nitroalkane having 1 to 3 carbon atoms, and a third component of 1,2-epoxyalkane having 2 to 7 carbon atoms or phosphite ester. Stabilized dichlorotrifluoroethane is useful in a variety of vapor degreasing, cold cleaning, and solvent cleaning applications including defluxing.

Dichlorotrifluoroethane stabilized to minimize hydrolysis thereof

Novel partially fluorinated alkanes having the Formula: ##STR1## wherein each R is the same or different and is selected from the group consisting of CF.sub.3, CHF.sub.2, CH.sub.2 F, and CH.sub.3 CF.sub.2, and R' is an alkyl or fluoroalkyl group having 1 to 6 carbon atoms with the proviso that when each R is CF.sub.3, R' is not CF.sub.3 (CF.sub.2).sub.2 --, CF.sub.3 CF.sub.2 --, or CF.sub.3 have utility as solvents in a variety of industrial cleaning applications including cold cleaning, dry cleaning, and defluxing of printed circuit boards.

Method of cleaning using partially fluorinated alkanes having a tertiary

Novel partially fluorinated alkenes having the Formula: ##STR1## wherein each R is the same or different and is selected from the group consisting of CF.sub.3, CHF.sub.2, CH.sub.2 F, and CH.sub.3 CF.sub.2, and R' is an alkenyl or fluoroalkenyl group having 1 to 6 carbon atoms have utility as solvents in a variety of industrial cleaning applications including cold cleaning, dry cleaning, and defluxing of printed circuit boards.

Method of cleaning using partially fluorinated alkenes having a tertiary

Partially fluorinated alkenes having a tertiary structure

Novel partially fluorinated alkanes having the Formula: ##STR1## wherein each R is the same or different and is selected from the group consisting of CF.sub.3, CHF.sub.2, CH.sub.2 F, and CH.sub.3 CF.sub.2, and R' is an alkyl or fluoroalkyl group having 1 to 6 carbon atoms with the proviso that when each R is CF.sub.3, R' is not CF.sub.3 (CF.sub.2).sub.2 -, CH.sub.3 CF.sub.2 -, or CF.sub.3 have utility as solvents in a variety of industrial cleaning applications including cold cleaning, dry cleaning, and defluxing of printed circuit boards.

Partially fluorinated alkanes having a tertiary structure

Azeotrope-like compositions comprising 1,1,2-trichloro-1,2,2-trifluoroethane; 1,2-dichloroethylene; and alkanol having 3 to 7 carbon atoms have utility as degreasing agents and as solvents in a variety of industrial cleaning applications including cold cleaning and defluxing a printed circuit boards.

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East Aurora, NY, United States of America

Chien C Li