Taiwan Semiconductor Manufacturing Comp. Ltd.

Chieh-Jan Huang

Yu-Cheng Chang

Ming-Lee Lee

Chiang-Jeh Chen

Keng-Hui Pan

Yung-Long Chen

Tzu-Sou Chuang

Heng-Yi Tseng

Yung-Ching Chen

Chun-Feng Hsu

Chi-Wen Kuo

Chin-Hsing Su

A method includes moving a drum containing a chemical liquid into a chamber of a chemical liquid supplying system. The drum is connected with a testing pipe. The chemical liquid is pumped from the drum to the testing pipe. A condition of the chemical liquid flowing through the testing pipe is monitored. Whether the chemical liquid is supplied to a processing tool is determined based on the condition of the chemical liquid.

Method of supplying chemical liquid

In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.

Chemical liquid supplying system and method of supplying chemical liquid

A gas-supply system includes a gas container filled with gas, a gas flow controller coupled to the gas container, and an operation device electrically connected to the gas flow controller. The gas-supply system further includes a buffer tank coupled to the gas flow controller and configured to receive the gas from the gas container via the gas flow controller. Furthermore, a pressure transducer disposed on the buffer tank and configured to generate a pressure signal to the operation device according to the pressure of the gas in the buffer tank. The operation device is configured to generate a control signal to the gas flow controller according the pressure signal, and the gas flow controller is configured to adjust the flow rate of the gas according to the control signal to keep the pressure of the gas in the buffer tank in a predetermined pressure range.

Gas-supply system and method

Embodiments of mechanisms of an air treatment system are provided. The air treatment system includes a heating tank having a heating chamber containing air. The air includes gas, water vapor, a number of contaminants floating thereon. The air treatment system further includes a cooling tank having a first cooling chamber receiving the air from the heating chamber. Some of the water vapor in the first cooling tank condenses to a number of droplets, and some of the contaminants are mixed with into the droplets.

Mechanisms for air treatment system and air treatment method

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Hsinchu, Taiwan

Chieh-Jan Huang