United Microelectronics Corp.

Chia-Wen Cheng

Li-Chung Lee

Chung-Hsien Kao

Ying-Ming Cheng

The present invention provides a flow-control apparatus with a check function for controlling the flow resistance of a photoresist solution. The apparatus is connected to a photoresist supply device, the photoresist supply device comprising a tank for storing the photoresist solution, a pipe partially submerged in the photoresist solution in the tank to transport the photoresist solution, and a pump for drawing the photoresist solution from the tank. The apparatus comprises a housing and a sphere. The housing comprises a chamber, a top opening positioned at the top of the chamber, and a bottom opening positioned at the bottom of the chamber, wherein the top opening can be mated to an end of the pipe or to a bottom opening of another apparatus. The sphere is moveably set inside the chamber of the housing and increases the flow resistance of the photoresist solution. The number of apparatuses mounted in series with the end of the pipe can be changed to control the flow resistance of the photoresist solution through the pipe when drawing the photoresist solution from the tank.

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Chang-Hua, Taiwan

Chia-Wen Cheng