Artilux Corporation

Chia-Peng Lin

Szu-Lin Cheng

Chien-Yu Chen

Yu-Hsuan Liu

Tsung-Ting Wu

Yun-Chung Na

Shu-Lu Chen

Han-Din Liu

Ming-Jay Yang

Chieh-Ting Lin

Hui-Wen Chen

Chung-Chih Lin

Kuan-Chen Chu

Pin-Tso Lin

A waveguide structure includes a first surface having a first width, a second surface having a second width, the second surface being opposite to the first surface, and a sidewall surface connecting the first surface and the second surface. The first width is greater than the second width.

Waveguide structure and optoelectronic device comprising the same

Structures and techniques introduced here enable the design and fabrication of photodetectors (PDs) and/or other electronic circuits using typical semiconductor device manufacturing technologies meanwhile reducing the adverse impacts on PDs' performance. Examples of the various structures and techniques introduced here include, but not limited to, a pre-PD homogeneous wafer bonding technique, a pre-PD heterogeneous wafer bonding technique, a post-PD wafer bonding technique, their combinations, and a number of mirror equipped PD structures. With the introduced structures and techniques, it is possible to implement PDs using typical direct growth material epitaxy technology while reducing the adverse impact of the defect layer at the material interface caused by lattice mismatch.

Multi-wafer based light absorption apparatus and applications thereof

Growing community of inventors

Zhubei, Taiwan

Chia-Peng Lin