Chunghwa Picture Tubes, Ltd.

Chia-Chien Chen

Bing-Wei Wu

Te-Hua Teng

Fang-Yi Lu

Yun-Pei Yang

Chia-Nan Shen

Wen-Chun Yeh

Hung-Chi Liao

An AMOLED display device includes a substrate, a device layer, a flat layer, a first, a second, and a third color filter layers, a first, a second, and a third pixel electrodes, a first, a second and a third organic light emitting layers. The device layer on the substrate includes active devices. The flat layer on the device layer includes contact window openings. The first color filter layer on the flat layer has a first pixel area and a first opening configured above a part of the contact window openings. The second color filter layer on the flat layer has a second pixel area and a second opening configured above a part of the contact window openings. The third color filter layer on the flat layer has a third pixel area and a third opening configured above a part of the contact window openings.

Active matrix organic light emitting diode display device and structure of such device

A method for fabricating an AMOLED display device is provided. A substrate is provided. A device layer having multiple active devices is formed on the substrate. A flat layer is configured on the device layer. A first, a second and a third color photoresistant layers are respectively configured on the flat layer and are patterned to form a first, a second and a third color filter layers. The first, the second and the third color filter layers respectively define a first, a second and a third pixel areas and are used for etching masks to etch the flat layer for exposing parts of the active devices. A first, a second and a third pixel electrode are respectively configured in the mentioned pixel areas and are electrically connected with the active devices. A first, a second and a third organic light emitting layers are respectively configured on the mentioned pixel electrodes.

Method for fabricating active matrix organic light emitting diode display device and structure of such device

A manufacturing method of a thin film transistor is provided. A buffer layer is formed on a substrate, and then a first and a second poly-silicon island are formed thereon. A gate-insulating layer is formed on the substrate, and a first and a second gate are formed thereon. A sacrificed layer is formed on the substrate and a photo-resist layer is formed thereon. The sacrificed layer above the first poly-silicon island is removed by using the photo-resist layer as a mask. A first ion implantation process is performed to form a first source/drain. The photo-resist layer is removed and a second ion implantation process is performed to form a second source/drain. At the same time, the second ion implantation process is used to implant ions into the buffer layer below the two sides of the second gate. A lightly-doped ion implantation process is performed after removing the sacrificed layer.

Manufacturing method of thin film transistor including implanting ions through polysilicon island and into underlying buffer layer

Growing community of inventors

Taipei, Taiwan

Chia-Chien Chen