Taiwan Semiconductor Manufacturing Comp. Ltd.

Chi-Tung Lai

Yung-Long Chen

Ching-Jung Hsu

Fang-Pin Chiang

Ming-Chieh Hsu

Yung-Ti Hung

Yu-Chun Chen

Feng-An Yang

Bo-Zhang Chen

Tsung-Huang Chen

Wei-Cheng Li

Heng-Yi Tseng

Chong-Cheng Su

Chi-Wei Chiu

Heng-yi Tseng

A liquid preparation method is provided. The method includes measuring, with a detection member, a quantity of a liquid stored in a liquid tank by emitting a detection signal toward a floating member positioned in a tube. The tube extends in a height direction of the liquid tank and fluidly connects to two connecting ports of the liquid tank that are located at opposite sides of a surface of the liquid, and the position of the floating member in the tube varies according to a level of the liquid in the liquid tank. The method also includes regulating the liquid in the liquid tank in response to the quantity of the liquid in the liquid tank.

Liquid supply system and liquid preparation method

A slurry blending tool may include a blending tank to receive and blend one or more materials into a slurry, and at least one inlet pipe connected to the blending tank and to provide the one or more materials to the blending tank. The at least one inlet pipe may vertically enter the blending tank and may not contact the blending tank. The slurry blending tool may include a blending pump partially provided within the blending tank and to blend the one or more materials into the slurry. The slurry blending tool may include an outlet pipe connected to the blending pump and to remove the slurry from the blending tank.

High-throughput, precise semiconductor slurry blending tool

A chemical dispensing system is capable of simultaneously supplying a semiconductor processing chemical for production and testing through the use of independent chemical supply lines, which reduces production downtime of an associated semiconductor process, increases throughput and capability of the semiconductor process, and/or the like. Moreover, the capability to simultaneously supply the semiconductor processing chemical for production and testing allows for an increased quantity of semiconductor processing chemical batches to be tested with minimal impact to production, which increases quality control over the semiconductor processing chemical. In addition, the independent chemical supply lines may be used to supply the semiconductor processing chemical to production while independently filtering semiconductor processing chemical directly from a storage drum through a filtration loop.

Chemical dispensing system

A liquid supply system is provided. The liquid supply system includes a liquid tank configured to store a liquid. The liquid supply system also includes a liquid measurement module positioned outside the liquid tank and fluidly connected two connecting ports that are located at opposite sides of a surface of the liquid stored in the liquid tank. The liquid tank includes a tube extends parallel to a height direction of the liquid tank. The liquid tank also includes a floating member located in the tube and configured to float on the liquid. The liquid tank further includes a detection member configured to emit a detection signal toward the floating member.

Disclosed herein is a method of providing slurry to a chemical mechanical planarization (CMP) station. The method includes the operations of: mixing slurry, water and a chemical to form dilute slurry; measuring a surface tension of the dilute slurry; supplying the dilute slurry to a CMP station through piping; and modulating a flow rate of the dilute slurry in the piping in accordance with the measured surface tension.

Slurry feed system and method of providing slurry to chemical mechanical planarization station

A slurry feed system includes a valve manifold, a mixing tank, a slurry feed pump, a surface tension meter and suction piping, discharge piping as well as slurry return piping. The valve manifold includes inlet piping, outlet piping fluidly coupled to the inlet piping, and a slurry discharge header for supplying slurry to CMP stations. The slurry feed pump is connected to the mixing tank by the suction piping. The discharge piping is routed from the slurry feed pump to the inlet piping of the valve manifold. The slurry return piping is routed from the outlet piping of the valve manifold to the mixing tank. The suction piping, the discharge piping, the inlet piping, the outlet piping and the slurry return piping define a first slurry supply loop. The surface tension meter is coupled to the first slurry supply loop.

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Hsinchu, Taiwan

Chi-Tung Lai