Taiwan Semiconductor Manufacturing Comp. Ltd.

Chi-Ren Chen

Jeng-Horng Chen

Chien-Chih Chen

Shu-Hao Chang

Kuo-Chang Kau

Ying-Chih Lin

Pi-Yeh Chia

Provided is a material composition and method for that includes providing a substrate and forming a resist layer over the substrate. In various embodiments, the resist layer includes a multi-metal complex including an extreme ultraviolet (EUV) absorption element and a bridging element. By way of example, the EUV absorption element includes a first metal type and the bridging element includes a second metal type. In some embodiments, an exposure process is performed to the resist layer. After performing the exposure process, the exposed resist layer is developed to form a patterned resist layer.

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Yilan County, Taiwan

Chi-Ren Chen