Tpo Displays Corporation

Chi-Ming Cheng

Kuang-Lung Kuo

Dai-Liang Ting

Chi-Jain Wen

Chia-Yi Tsai

Hsiang-Ju Chuang

Tan-Ching Yen

A process for fabricating a color filter. An imprint mask accompanied by a dry etching step is used to replace the conventional wet development process. The present invention attains the advantages of increased pattern uniformity of color elements, improved film flatness of color elements, increased resolution, reduced process time, reduced process cost, and elimination of the use of developing solvent to reduce waste treatment and environmental impact.

Color filter process

A color filter including red, green, and blue resists in three subpixel regions in each pixel region is disclosed. One pixel region includes two kinds of color resists, and the color resist in the reflective region has lower purity than the color resist in the transmissive region. Another pixel region includes only one kind of color resist.

Transflective liquid crystal display and color filter with two kinds of color resists for the same

A method for removing color resist from an exposure alignment mark. In an embodiment, a color resist layer is formed over a color filter substrate with an alignment mark thereon. A concentric tube system is provided with an outer tube surrounding an inner tube. A solvent is injected via the inner tube to contact and dissolve the color resist directly overlying the alignment mark. The dissolved color resist is extracted by the outer tube of the concentric tube system to expose the alignment mark. By repeating the dissolving and extraction steps, all alignment marks on the color filter substrate are consequently uncovered for subsequent exposure alignment.

Growing community of inventors

Tainan, Taiwan

Chi-Ming Cheng