Taiwan Semiconductor Manufacturing Comp. Ltd.

Chi-Lin Lu

Sheng-Chi Chin

I-Hsiung Huang

Heng-Jen Lee

Yao-Ching Ku

A method and system for fabricating a substrate is disclosed. First, a plurality of process chambers are provided, at least one of the plurality of process chambers adapted to receive at least one plasma filtering plate and at least one of the plurality of process chambers containing a plasma filtering plate library. A plasma filtering plate is selected and removed from the plasma filtering plate library. Then, the plasma filtering plate is inserted into at least one of the plurality of process chambers adapted to receive at least one plasma filtering plate. Subsequently, an etching process is performed in the substrate.

Growing community of inventors

Hsinchu, Taiwan

Chi-Lin Lu