Skhynix Inc.

Chi-Ho Kim

Jae-Geun Oh

Hyo-June Kim

Hyun-Seok Kang

Ki-Seon Park

Su-Jin Chae

Guk-Cheon Kim

Jong-Han Shin

Sung-Joon Yoon

Myoung-Sub Kim

Seung-Mo Noh

Sung-Kyu Min

Eung-Rim Hwang

Dae-Gun Kang

Su-Yeon Lee

Min-Seon Kang

Sang-Hoon Cho

An electronic device includes a semiconductor memory. A method for fabricating the electronic device includes forming a first memory cell extending vertically from a surface of substrate and having a first upper portion that protrudes laterally, forming a second memory cell extending vertically from the surface of the substrate and having a second upper portion that protrudes laterally towards the first upper portion, and forming a liner layer over the first and second memory cells, the liner layer having a first portion disposed over the first upper portion and a second portion disposed over the second upper portion, the first and second portions of the liner layer contacting each other.

Electronic device and method for fabricating the same

This technology provides an electronic device and a method for fabricating the same. An electronic device in accordance with an implementation of this document may include a substrate including a first portion in a first region and a second portion in a second region; a plurality of memory cells disposed over the first portion of the substrate; a first insulating layer extending over the second portion of the substrate and at least partially filling a space between adjacent ones of the plurality of memory cells; and a second insulating layer disposed over the first insulating layer. The first insulating layer has a dielectric constant smaller than that of the second insulating layer, a thermal conductivity smaller than that of the second insulating layer, or both.

An electronic device may include a semiconductor memory, and the semiconductor memory may include a plurality of memory cells each including a variable resistance layer; a substituted dielectric layer filling a space between the plurality of memory cells; and an unsubstituted dielectric layer disposed adjacent to the variable resistance layer of each of the plurality of memory cells, wherein the unsubstituted dielectric layer may include a flowable dielectric material.

An electronic device includes a semiconductor memory that includes: first and second lines spaced apart from each other and crossing each other; a third line spaced apart from the second line and crossing the second line; a first variable resistance element interposed between the first and second lines and overlapping an intersection of the first and second lines; a second variable resistance element interposed between the second and third lines and overlapping an intersection of the second and third lines, a part of the second variable resistance element generating a greater amount of heat than a part of the first variable resistance element when a current flows through the first variable resistance element in an opposite direction to a current flowing through the second variable resistance element; and a material layer serially connected with the second variable resistance element, disposed between the second and third lines, and exhibiting electrical resistance.

Electronic device

An electronic device may include a semiconductor memory. The semiconductor memory may include a trench formed in a substrate; a gate dielectric layer formed on a surface of the trench; a gate electrode which is formed on the gate dielectric layer, gap-fills a part of the trench, and contains dopants; a diffusion region which is formed to be in contact with the surface of the trench and to correspond to the gate electrode in the substrate; junction regions formed in the substrate at both sides of the trench; and a memory element coupled to a junction region in a side of the trench.

Provided is an electronic device including a semiconductor memory. The semiconductor memory may include: an interlayer dielectric layer formed over a substrate and having a contact hole; a contact plug formed in a lower part of the contact hole; a contact pad formed in an upper part of the contact hole; an amorphous buffer layer interposed between the contact plug and the contact pad; and a variable resistance element formed over the contact pad.

A method for fabricating an electronic device that includes a metal-insulator-semiconductor (M-I-S) structure includes: providing a semiconductor layer; forming a primary insulation layer of a first thickness over the semiconductor layer; forming a reactive metal layer of a second thickness over the primary insulation layer, where the second thickness is greater than the first thickness; forming a primary capping layer of a third thickness over the reactive metal layer, where the third thickness is greater than the second thickness; and performing a thermal treatment.

Electronic device including metal-insulator-semiconductor structure and method for fabricating the same

An electronic device is provided to include a semiconductor memory including a variable resistance element. The variable resistance element may include a variable resistance pattern including a first electrode layer, a variable resistance layer, and a second electrode layer that are sequentially stacked; and a switching assist structure spaced from a side wall of the variable resistance pattern to surround the variable resistance pattern and including multilayered conductive structures that are vertically spaced from one another.

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Yongin, South Korea

Chi-Ho Kim