Taiwan Semiconductor Manufacturing Comp. Ltd.

Chi-Ching Lo

Ding-I Liu

Po-Hsiung Leu

Ray Chuang

Jen-Chi Chang

Huan-Wen Lai

Cheng-Liang Chang

Jen Wei

Chian-Kuo Huang

Tzu-Chun Lin

Ching-Sun Lee

Cheng-Yua Chuang

Ho-Ta Chuang

Neo-Feng Chiou

Yen-Bo Huang

A plasma reactor includes an enclosure having a top and a bottom and defining a processing chamber. Inlets are formed in the enclosure for injecting process gas into the chamber. An outlet is formed in the enclosure for withdrawing gas from the chamber. A platform is positioned to support a wafer in the chamber above the bottom. A plurality of coils is positioned above the top of the chamber. Each coil is coupled to a radio frequency generator.

High density plasma reactor with multiple top coils

A disassembling device for separating a pedestal, a ceramic element and a base from an electrostatic chuck assembly. The base has a first end surface and a second end surface. The ceramic element is disposed on the first end surface. The pedestal is disposed on the ceramic element. The disassembling device includes a main body and at least one pushing element. The main body is disposed on the second end surface and has a through hole. The at least one pushing element penetrates the through hole and pushes against the ceramic element and pedestal to separate the ceramic element and pedestal from the first end surface of the base.

Electrostatic chuck assembly having disassembling device

Growing community of inventors

Hsinchu, Taiwan

Chi-Ching Lo