United Microelectronics Corp.

Chi-Chih Chuang

Hui-Shen Shih

Chi-Min Yu

Yu-Fang Chien

The present invention relates to a method of supplying the polishing liquid by periodically interrupt the supply of the polishing liquid, thus avoid over-supply or wastage of the polishing liquid. Hence, the consumption of the polishing liquid can be decreased and the production cost can be lower.

Method of supplying polishing liquid

A CMP head includes a membrane support and a membrane. The membrane support is disk-shaped, having an origin and a radius R. The membrane support has at least a ventilator disposed in a central region within the range between origin and (&#x2154;) R, and at least a diversion opening disposed in a peripheral region within the range between (&#x2154;) R and R. The membrane includes a disk-shaped part disposed on the first surface of the membrane support, and an annular part surrounding the annular sidewall of the membrane support.

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Hsinchu, Taiwan

Chi-Chih Chuang