Applied Materials, Inc.

Nikon Corporation

X Development LLC

Google Inc.

Chetan Mahadeswaraswamy

Duy D Nguyen

Kartik Ramaswamy

Hamid Noorbakhsh

Walter R Merry

Leo Francis Casey

Sergio Fukuda Shoji

Brad L Mays

Joel Fraser Atwater

Fernando Silveira

Peter Light

Siyuan Xin

Shane C Nevil

Yashaswini Pattar

Crystal Elayna Winston

Mehrdad Roosta

Tina Tsong

Douglas A Buchberger, Jr

Michael B Binnard

Chunlei Zhang

Douglas Buchberger

Hamid Tavassoli

David Palagashvili

Xiaoping Zhou

Bryan Liao

Johnathan Marquez

Joseph P Rossi

Kallol Bera

Pai-Hsueh Yang

Larry D Elizaga

Michel Pharand

Jingjin Xie

Tsutomu Ogiwara

Christopher James Ducote

J Kyle Wells

Methods, systems, and apparatus for an infrared and visible imaging system. In some implementations, Image data from a visible-light camera is obtained. A position of a device is determined based at least in part on the image data from the visible-light camera. An infrared camera is positioned so that the device is in a field of view of the infrared camera, with the field of view of the infrared camera being narrower than the field of view of the visible-light camera. Infrared image data from the infrared camera that includes regions representing the device is obtained. Infrared image data from the infrared camera that represents the device is recorded. Position data is also recorded that indicates the location and pose of the infrared camera when the infrared image data is acquired by the infrared camera.

Infrared and visible imaging system for monitoring equipment

Infrared and visible imaging system

Systems and methods for extracting a feature in an image are provided. In one example embodiment, a computer-implemented method includes obtaining image data representing a scene, wherein the image data includes a plurality of images of the scene, each image associated with a different polarization angle. The method includes determining attribute information based at least in part on the plurality of images. The method includes determining one or more features in the image data based at least in part on the attribute information.

Systems and methods for improved feature extraction using polarization information

Methods and systems for controlling temperatures in plasma processing chamber with a combination of proportional and pulsed fluid control valves. A heat transfer fluid loop is thermally coupled to a chamber component, such as a chuck. The heat transfer fluid loop includes a supply line and a return line to each of hot and cold fluid reservoirs. In an embodiment, an analog valve (e.g., in the supply line) is controlled between any of a closed state, a partially open state, and a fully open state based on a temperature control loop while a digital valve (e.g., in the return line) is controlled to either a closed state and a fully open state.

Component temperature control using a combination of proportional control valves and pulsed valves

Infrared and visible imaging system for device identification and tracking

Methods and systems for controlling temperatures in plasma processing chamber with reduced controller response times and increased stability. Temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. A feedforward control signal compensating disturbances in the temperature attributable to the plasma power may be combined with a feedback control signal counteracting error between a measured and desired temperature.

Feedforward temperature control for plasma processing apparatus

A stage assembly () that moves a device () includes a stage () that retains the device (), a base (), a stage mover assembly (), and a supply system (A). The supply system (A) is secured to and positioned on the stage (). The supply system (A) includes a circulation system () that circulates a circulation fluid () through a circulation conduit (D) in the stage () to control the temperature of the stage () and the device (). The circulation system () can include a storage container assembly (A) that defines a supply chamber () that supplies pressurized circulation fluid () to the circulation conduit (D), a return chamber () that receives the circulation fluid () that was circulated through the circulation conduit (D), a movable piston () that separates the supply chamber () from the return chamber (), and a piston urger () that urges the piston () to move to reduce the supply volume of the supply chamber () and urge the circulation fluid () out of the supply chamber ().

On-board supply system for a stage assembly

A stage assembly for positioning a device includes: (i) a stage that retains the device; (ii) a base; (iii) a mover assembly that moves the stage along a first axis, along a second axis, and along a third axis relative to the base; (iv) a magnetic sensor system that monitors the movement of the stage along the first, second and third axes, the magnetic sensor system generating a magnetic sensor signal; (v) a second sensor system that monitors the movement of the stage along the first, second and third axes, the second sensor system generating a second sensor signal; and (vi) a control system that controls the mover assembly using at least one of the magnetic sensor signal and the second sensor signal.

Magnetic sensor calibration and servo for planar motor stage

A stage assembly () that includes (i) a stage () that retains a device (); (ii) a reaction assembly () that is spaced apart from the stage (); (iii) a stage mover () that moves the stage (), the stage mover () including a magnet array () that is coupled to the stage () and a conductor array () that is coupled to the reaction assembly (); (iv) a temperature adjuster (); and (v) a control system () that selectively controls the temperature adjuster (). The conductor array () includes a set of first zone conductor units (), and a set of second zone conductor units (). The temperature adjuster () independently adjusts the temperature of the set of first zone conductor units (), and the set of second zone conductor units ().

System and method for controlling a temperature of a reaction assembly

Methods and systems for controlling temperatures in plasma processing chamber for a wide range of setpoint temperatures and reduced energy consumption. Temperature control is coordinated between a coolant liquid loop and a heat source by a control algorithm implemented by the plasma processing module controller. The control algorithm may completely stop the flow of coolant liquid to a temperature-controlled component in response to a feedback signal indicating an actual temperature is below the setpoint temperature. The control algorithm may further be based at least in part on a feedforward control signal derived from a plasma power or change in plasma power input into the processing chamber during process recipe execution.

Component temperature control by coolant flow control and heater duty cycle control

Methods and systems for controlling temperatures in plasma processing chamber via pulsed application of heating power and pulsed application of cooling power. In an embodiment, temperature control is based at least in part on a feedforward control signal derived from a plasma power input into the processing chamber. In further embodiments, fluid levels in each of a hot and cold reservoir coupled to the temperature controlled component are maintained in part by a passive leveling pipe coupling the two reservoirs. In another embodiment, digital heat transfer fluid flow control valves are opened with pulse widths dependent on a heating/cooling duty cycle value and a proportioning cycle having a duration that has been found to provide good temperature control performance.

Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow

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San Francisco, CA, United States of America

Chetan Mahadeswaraswamy