Radiation Dynamics, Inc.

Chester C Thompson

Marshall Robert Cleland

Joseph Paul Farrell

Edward J Lopez

Raymond J Loby

Apparatus and method for attenuating the energy and increasing the angular scattering of a radiation beam particularly suited for electron beams and for promoting dose uniformity in irradiated target products, including using a cooled, intermediate scatter plate which may or may not be perforated and a radiation reflective target basket.

Apparatus and method for promoting uniform dosage of ionizing radiation

An apparatus for producing a very high DC potential output from an AC input. Multiple secondary circuits, each comprised of an individual coil wound about a separate magnetic core, are positioned within the magnetic field of a single primary coil. The output of each secondary circuit is rectified. The output of all secondary circuits is combined in series to provide the high DC potential. The seconary cores are supplied in parallel from the magnetic flux of the primary coil. The primary core and coil form an essentially cylindrical shell, with the secondary cores and coils located within the cylinder interior.

Magnetic flux coupled voltage multiplication apparatus

Provided herein is an electro-magnetic field former for controlling charged particle trajectories in a scanning charge particle source including a pair of induction coils and C-shaped ferromagnetic yokes which are positioned in the air space between the particle source and a target at the target edges to normalize the angle of incidence of the particles relatve to the target and to deflect scattered particles into the target edges. Also provided is a field former controller to compensate for induced flux variations caused by an oscillating particle beam.

Magnetic field former for charged particle beams

The voltage at the high voltage terminal of a first particle accelerator is stabilized particularly during pulsed operation by producing a compensating current at its accelerator terminal such as to maintain the voltage of the terminal constant. The compensating current is produced by a second particle accelerator coupled between the accelerator terminal and a high voltage terminal connected with a high voltage DC power supply. The charged particle flow through the second particle accelerator is such that the charge on the accelerator terminal of the first accelerator remains substantially constant even though the voltage at the high voltage terminal drops during simultaneous pulsed operation of both particle accelerators.

Voltage stabilized particle accelerator system and method

A higher current capability is provided in a high voltage accelerator of the Dynamitron type (U.S. Pat. No. 2,875,394) by paralleling basic building blocks whereby increased current is achieved without any change in the circuits of the basic building block which are interleaved to permit parallel connection and thus current multiplication without affecting machine voltage or performance.

High current, high voltage multiplication apparatus

A scanning beam deflection system and method utilizes a beam scanning device for producing rays diverging from a central axis of a beam of charged particles and a deflection magnet assembly for deflecting the scanning beam substantially 270.degree. within an evacuated deflection chamber such that the deflected scanning beam exits an offset beam window in the deflection chamber and has rays diverging from the central axis of the deflected scanning beam at substantially the same angle as the diverging rays produced by the beam scanning device. The system and method is particularly useful for irradiating internal surfaces of hollow articles with the deflection chamber and deflection magnet assembly disposed along an axis of symmetry of the object.

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Roslyn Heights, NY, United States of America

Chester C Thompson